{"title":"6.3:通过减少异物来改善超窄边框显示器的交叉线缺陷","authors":"Xintong Wang, Lihong Gui, Yanjun Song Cooper","doi":"10.1002/sdtp.16222","DOIUrl":null,"url":null,"abstract":"Cross line defects are stubborn problems which puzzles ultra narrow bezel displays for a long time. It not only seriously lower yield of ultra narrow bezel displays, but also is difficult to repair in cell processing by NRP (normal repair). In this paper we mainly describe improving cross line defects by decreasingforeign matter in the process of CVD (Chemical Vapor Deposition).","PeriodicalId":21706,"journal":{"name":"SID Symposium Digest of Technical Papers","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"6.3: Improving Cross Line Defects of Ultra Narrow Bezel Displays by Decreasing Foreign Matter\",\"authors\":\"Xintong Wang, Lihong Gui, Yanjun Song Cooper\",\"doi\":\"10.1002/sdtp.16222\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Cross line defects are stubborn problems which puzzles ultra narrow bezel displays for a long time. It not only seriously lower yield of ultra narrow bezel displays, but also is difficult to repair in cell processing by NRP (normal repair). In this paper we mainly describe improving cross line defects by decreasingforeign matter in the process of CVD (Chemical Vapor Deposition).\",\"PeriodicalId\":21706,\"journal\":{\"name\":\"SID Symposium Digest of Technical Papers\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"SID Symposium Digest of Technical Papers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1002/sdtp.16222\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"SID Symposium Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1002/sdtp.16222","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
6.3: Improving Cross Line Defects of Ultra Narrow Bezel Displays by Decreasing Foreign Matter
Cross line defects are stubborn problems which puzzles ultra narrow bezel displays for a long time. It not only seriously lower yield of ultra narrow bezel displays, but also is difficult to repair in cell processing by NRP (normal repair). In this paper we mainly describe improving cross line defects by decreasingforeign matter in the process of CVD (Chemical Vapor Deposition).