6.3:通过减少异物来改善超窄边框显示器的交叉线缺陷

Xintong Wang, Lihong Gui, Yanjun Song Cooper
{"title":"6.3:通过减少异物来改善超窄边框显示器的交叉线缺陷","authors":"Xintong Wang, Lihong Gui, Yanjun Song Cooper","doi":"10.1002/sdtp.16222","DOIUrl":null,"url":null,"abstract":"Cross line defects are stubborn problems which puzzles ultra narrow bezel displays for a long time. It not only seriously lower yield of ultra narrow bezel displays, but also is difficult to repair in cell processing by NRP (normal repair). In this paper we mainly describe improving cross line defects by decreasingforeign matter in the process of CVD (Chemical Vapor Deposition).","PeriodicalId":21706,"journal":{"name":"SID Symposium Digest of Technical Papers","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"6.3: Improving Cross Line Defects of Ultra Narrow Bezel Displays by Decreasing Foreign Matter\",\"authors\":\"Xintong Wang, Lihong Gui, Yanjun Song Cooper\",\"doi\":\"10.1002/sdtp.16222\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Cross line defects are stubborn problems which puzzles ultra narrow bezel displays for a long time. It not only seriously lower yield of ultra narrow bezel displays, but also is difficult to repair in cell processing by NRP (normal repair). In this paper we mainly describe improving cross line defects by decreasingforeign matter in the process of CVD (Chemical Vapor Deposition).\",\"PeriodicalId\":21706,\"journal\":{\"name\":\"SID Symposium Digest of Technical Papers\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"SID Symposium Digest of Technical Papers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1002/sdtp.16222\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"SID Symposium Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1002/sdtp.16222","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

跨线缺陷是长期困扰超窄边框显示器的顽症。它不仅严重降低了超窄边框显示器的良率,而且在细胞处理中难以通过正常修复(NRP)进行修复。本文主要介绍了通过减少化学气相沉积(CVD)过程中的异物来改善交叉缺陷的方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
6.3: Improving Cross Line Defects of Ultra Narrow Bezel Displays by Decreasing Foreign Matter
Cross line defects are stubborn problems which puzzles ultra narrow bezel displays for a long time. It not only seriously lower yield of ultra narrow bezel displays, but also is difficult to repair in cell processing by NRP (normal repair). In this paper we mainly describe improving cross line defects by decreasingforeign matter in the process of CVD (Chemical Vapor Deposition).
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
P‐64: Investigation of Fabrication Technologies of GaN‐based Micro‐LED Devices P‐67: Research of photoelectric performance GaN based green Micro‐LED 77‐2: Quantum‐Dot Color Conversion Achieved by A Novel Structure of Hollow Cylindrical Blue MicroLED P‐68: High Luminance Blue Micro‐LEDs in 4×4 and 8×8 Array 76‐3: A Modified Unsupervised Vision Transformer Network for High‐fidelity Computer‐generated Holography
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1