基于双焦平行周边光抑制光刻的直接激光写入破衍射势垒(勘误)

IF 20.6 1区物理与天体物理 Q1 OPTICS Advanced Photonics Pub Date : 2023-10-19 DOI:10.1117/1.ap.5.5.059801

Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, Cuifang Kuang, Haifeng Li, Xu Liu

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引用次数: 0

摘要

由SPIE和中国激光出版社联合出版的《先进光子学》是一本高选择性、黄金开放获取的国际期刊，发表光学和光子学各个领域的创新研究，包括基础研究和应用研究。

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Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral photoinhibition lithography (Erratum)

Advanced Photonics, co-published by SPIE and Chinese Laser Press, is a highly selective, Gold Open Access, international journal publishing innovative research in all areas of optics and photonics, including fundamental and applied research.

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来源期刊

Advanced Photonics OPTICS-

CiteScore

22.70

自引率

1.20%

发文量

审稿时长

18 weeks

期刊介绍： Advanced Photonics is a highly selective, open-access, international journal that publishes innovative research in all areas of optics and photonics, including fundamental and applied research. The journal publishes top-quality original papers, letters, and review articles, reflecting significant advances and breakthroughs in theoretical and experimental research and novel applications with considerable potential. The journal seeks high-quality, high-impact articles across the entire spectrum of optics, photonics, and related fields with specific emphasis on the following acceptance criteria: -New concepts in terms of fundamental research with great impact and significance -State-of-the-art technologies in terms of novel methods for important applications -Reviews of recent major advances and discoveries and state-of-the-art benchmarking. The journal also publishes news and commentaries highlighting scientific and technological discoveries, breakthroughs, and achievements in optics, photonics, and related fields.