用于低温固态键合的钴微纳米锥阵列上的电沉积钯涂层

IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Electronic Materials Letters Pub Date : 2023-09-25 DOI:10.1007/s13391-023-00462-z
Jiunan Xie, Hua Hu, Peixin Chen, Han Lei, Anmin Hu, Yunwen Wu, Ming Li
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引用次数: 0

摘要

研究了使用钯涂层钴微纳锥阵列(MCA)和锡-3.0Ag-0.5Cu(重量百分比)焊料的低温固态接合技术。Co MCA 表面的钯改性层减少了氧化膜的生长。在 750 gf、175 °C、150 s 的粘合条件下,Co/Pd MCA 实现了低温固态粘合,剪切强度为 49.55 MPa,粘合界面没有发现空隙。显微观察表明,Co/Pd MCA 完全嵌入了软焊料中。测量了接合点的平均剪切强度,结果表明 Co/Pd MCA 比 Co MCA 具有更高的可靠性。这项工作凸显了基于 Co/Pd MCA 的键合技术的优势,具有广泛的实际应用潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Electrodeposited Palladium Coating on Co Micro-Nano Cones Array for Low-Temperature Solid-State Bonding

A low-temperature solid-state bonding technology using palladium-coated Co micro-nano cones array (MCA) and Sn-3.0Ag-0.5Cu (wt%) solder was investigated. The Pd modification layer on the surface of Co MCA reduced the growth of oxide film. Low-temperature solid-state bonding was achieved using Co/Pd MCA under the bonding condition of 750 gf, 175 °C and 150 s with the shear strength of 49.55 MPa, and there was no void found along the bonding interface. Microscopic observation revealed that Co/Pd MCA was fully embedded in the soft solder. The average shear strength of the bonding joint was measured and demonstrate that Co/Pd MCA has higher reliability than Co MCA. This work highlights the advantages of bonding based on Co/Pd MCA, which has great potential for extensive practical applications.

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来源期刊
Electronic Materials Letters
Electronic Materials Letters 工程技术-材料科学:综合
CiteScore
4.70
自引率
20.80%
发文量
52
审稿时长
2.3 months
期刊介绍: Electronic Materials Letters is an official journal of the Korean Institute of Metals and Materials. It is a peer-reviewed international journal publishing print and online version. It covers all disciplines of research and technology in electronic materials. Emphasis is placed on science, engineering and applications of advanced materials, including electronic, magnetic, optical, organic, electrochemical, mechanical, and nanoscale materials. The aspects of synthesis and processing include thin films, nanostructures, self assembly, and bulk, all related to thermodynamics, kinetics and/or modeling.
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