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Enhancing High-Frequency Magnetic Performance of Fe-Based Amorphous Alloy Powders Coated with Insulating Glass Frits
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-02-15 DOI: 10.1007/s13391-025-00550-2
Seung-Wook Kim, Tae-Kyung Lee, Ye-Ji Son, Hyo-Min Kim, Dae-Yong Jeong

Amorphous metal powders, known for their high saturation magnetization, low coercivity (Hc), and reduced eddy current loss, hold great promise for high-performance magnetic devices. However, elevated core losses at higher frequencies—primarily due to eddy currents—impair their efficiency, leading to significant heat dissipation. This study addresses this challenge by investigating the application of low-softening temperature (Ts) glass frits as an insulating coating to enhance the electrical and magnetic properties of Fe92.3Si3.5B3.0C0.7P0.5 (wt%) amorphous alloy powders. The practical implications of this research are significant, as it offers a potential solution to the problem of core losses at higher frequencies. The coated powders exhibited superior performance, with the lowest core loss measured at less than 321 mW/cm³ (Bm = 0.2 T at 1 MHz) and a high powder resistivity of up to 1.81 × 109 Ω∙cm while maintaining appropriate permeability. Calculation and experimental results demonstrated that adjusting the coating thickness and ensuring a uniform layer minimized inter-particle and intra-particle eddy current losses. This optimization led to a significant reduction in core loss, enhancing the material’s high-frequency performance. The study emphasizes the critical role of low Ts glass frits in balancing resistivity, magnetic properties, and core loss reduction, offering a practical pathway for developing efficient amorphous alloy powders for advanced magnetic applications, including compact inductors and energy-efficient devices in eco-friendly technologies.

Graphical Abstract

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引用次数: 0
Kinetic Investigation of CuSx Formation on Cu Substrates for Enhanced Electrochemical CO2 Reduction to HCOOH
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-02-13 DOI: 10.1007/s13391-025-00546-y
Jin Wook Lim, Won Seok Cho, Jong-Lam Lee

Copper sulfide (CuSx) is an electrocatalyst which selectively converts CO2 into HCOOH under harsh conditions. Here, we investigate the formation and kinetics of CuSx nanostructures on various multi-metal substrates to understand their catalytic properties in sulfur-containing environments. Using a combination of morphological, structural, and electrochemical analyses, we elucidate the time-dependent growth behavior of CuSx nanostructures with progressive void formation over time. Notably, we discover that CuSx formation is accelerated on substrates with galvanic corrosion-promoting metals such as Ag and Au, leading to enhanced selectivity for HCOOH during CO2 reduction. In contrast, coating Cu with corrosion-inhibiting metals like Sn, Ni, or In reduce HCOOH selectivity, highlighting the critical role of galvanic corrosion in the CuSx formation mechanism and its kinetics. This study experimentally identifies the impact of galvanic corrosion on CuSx formation mechanisms and offers insights for optimizing electrocatalytic systems.

Graphical Abstract

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引用次数: 0
Adaptable Low-Temperature Resistor Standard Composed of ITO thin Film
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-02-11 DOI: 10.1007/s13391-025-00548-w
Sebastian Złotnik, Małgorzata Nyga, Przemysław Morawiak, Witold Rzodkiewicz, Patryk Bruszewski, Marek A. Kojdecki, Jerzy Wróbel, Jarosław Wróbel

Herein, we present indium tin oxide (ITO) as a promising candidate for developing adaptable standard resistors. The ITO thin-film device structures exhibit an average resistivity of approx. 1.5 × 10–4 Ω ⋅ cm, demonstrating remarkable stability in resistance values over time and showcasing temperature-independent magnetoresistance, making them reliable for various applications. ITO resistor structures were found to be optimal with an area ≥10–7 cm2, without observed additional series resistance. The temperature dependence of resistance values changes by approx. 10% within a broad temperature range of 5–310 K in a predictable and repeatable way. Unlike traditional 2D materials, ITO can be processed without the necessity of a protective layer, facilitating easier integration into electronic circuits. Moreover, ITO demonstrates single-type electron characteristics, without hole-like contributions, being particularly suitable as a charge carrier transport control. Our experimental findings indicate that resistors made of ITO-coated glass thin films present a viable alternative to standard chip-type passive components, which are commonly used in electronic devices. This work highlights the potential of ITO as a durable and flexible material for advanced electronics, enabling the design of next-generation resistive elements that can adapt to varying operational conditions.

Graphical Abstract

{"title":"Adaptable Low-Temperature Resistor Standard Composed of ITO thin Film","authors":"Sebastian Złotnik,&nbsp;Małgorzata Nyga,&nbsp;Przemysław Morawiak,&nbsp;Witold Rzodkiewicz,&nbsp;Patryk Bruszewski,&nbsp;Marek A. Kojdecki,&nbsp;Jerzy Wróbel,&nbsp;Jarosław Wróbel","doi":"10.1007/s13391-025-00548-w","DOIUrl":"10.1007/s13391-025-00548-w","url":null,"abstract":"<div><p>Herein, we present indium tin oxide (ITO) as a promising candidate for developing adaptable standard resistors. The ITO thin-film device structures exhibit an average resistivity of approx. 1.5 × 10<sup>–4</sup> Ω ⋅ cm, demonstrating remarkable stability in resistance values over time and showcasing temperature-independent magnetoresistance, making them reliable for various applications. ITO resistor structures were found to be optimal with an area ≥10<sup>–7</sup> cm<sup>2</sup>, without observed additional series resistance. The temperature dependence of resistance values changes by approx. 10% within a broad temperature range of 5–310 K in a predictable and repeatable way. Unlike traditional 2D materials, ITO can be processed without the necessity of a protective layer, facilitating easier integration into electronic circuits. Moreover, ITO demonstrates single-type electron characteristics, without hole-like contributions, being particularly suitable as a charge carrier transport control. Our experimental findings indicate that resistors made of ITO-coated glass thin films present a viable alternative to standard chip-type passive components, which are commonly used in electronic devices. This work highlights the potential of ITO as a durable and flexible material for advanced electronics, enabling the design of next-generation resistive elements that can adapt to varying operational conditions.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"193 - 199"},"PeriodicalIF":2.1,"publicationDate":"2025-02-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s13391-025-00548-w.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Dielectric Bonding Method for 3D Integration Packaging Using Self-Assembled Monolayer
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-02-08 DOI: 10.1007/s13391-025-00547-x
Wonbin Kim, Sungjae Choi, Seongi Lee, Young-Chang Joo, Byoung-Joon Kim

The emergence of big data and artificial intelligence has promoted the semiconductor industry to increasingly adopt advanced three-dimensional stacking packaging technologies due to the limitations of device scaling. Traditional packaging methods, which rely on micro bumps and adhesives, struggle to meet the growing demands for sub-micrometer fine pitches. To address these challenges, bump-less direct bonding techniques, such as Cu/SiO₂ hybrid bonding, have gained attention, along with surface-activated bonding (SAB) using plasma treatment. However, plasma treatment poses risks, including Cu oxidation and potential short circuits from Cu particle transfer in fine-pitch applications. This study presents a novel plasma-free method that utilizes self-assembled monolayers (SAMs), thin molecular layers that spontaneously create ordered structures on surfaces, for dielectric surface activation. We deposited 3-aminopropyltriethoxysilane (APTES) on silicon dioxide (SiO₂), resulting in a hydrophilic layer that enhances bonding. Notably, a heat treatment significantly improved interfacial adhesion strength through the formation of an amorphous silicon (Si) layer. This SAM-based bonding technique, which enables dielectric surface without the need for plasma, holds promise for future fine-pitch hybrid bonding applications in 3D integrated packaging.

Graphical abstract

{"title":"Dielectric Bonding Method for 3D Integration Packaging Using Self-Assembled Monolayer","authors":"Wonbin Kim,&nbsp;Sungjae Choi,&nbsp;Seongi Lee,&nbsp;Young-Chang Joo,&nbsp;Byoung-Joon Kim","doi":"10.1007/s13391-025-00547-x","DOIUrl":"10.1007/s13391-025-00547-x","url":null,"abstract":"<div><p>The emergence of big data and artificial intelligence has promoted the semiconductor industry to increasingly adopt advanced three-dimensional stacking packaging technologies due to the limitations of device scaling. Traditional packaging methods, which rely on micro bumps and adhesives, struggle to meet the growing demands for sub-micrometer fine pitches. To address these challenges, bump-less direct bonding techniques, such as Cu/SiO₂ hybrid bonding, have gained attention, along with surface-activated bonding (SAB) using plasma treatment. However, plasma treatment poses risks, including Cu oxidation and potential short circuits from Cu particle transfer in fine-pitch applications. This study presents a novel plasma-free method that utilizes self-assembled monolayers (SAMs), thin molecular layers that spontaneously create ordered structures on surfaces, for dielectric surface activation. We deposited 3-aminopropyltriethoxysilane (APTES) on silicon dioxide (SiO₂), resulting in a hydrophilic layer that enhances bonding. Notably, a heat treatment significantly improved interfacial adhesion strength through the formation of an amorphous silicon (Si) layer. This SAM-based bonding technique, which enables dielectric surface without the need for plasma, holds promise for future fine-pitch hybrid bonding applications in 3D integrated packaging.</p><h3>Graphical abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"184 - 192"},"PeriodicalIF":2.1,"publicationDate":"2025-02-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571147","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhanced Light-Scattering Properties of Aqueous Chemical Bath Deposited ZnO Nanowires: Influence of Zinc Source Concentration
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-18 DOI: 10.1007/s13391-025-00545-z
Vinaya Kumar Arepalli, Eunyeong Yang, Choong-Heui Chung

This study investigates the light-diffusing capabilities of ZnO nanowires synthesized using the aqueous chemical bath deposition method on PET substrates. By systematically varying Zn source concentrations, the morphology and optical performance of ZnO nanowires were tuned. Scanning electron microscopy revealed that nanowires grown at optimal Zn sources (0.75 g and 1.2 g) exhibited sharp tip morphologies, while higher or lower Zn sources led to flatter tips due to isotropic growth or insufficient precursor availability. Optical characterization demonstrated that ZnO nanowires grown at 1.2 g of the Zn source achieved a maximum total transmittance of ~ 58% and a scattering angle of 53°, outperforming commercial optical diffusers. The transmission haze values peaked at 98.5% for nanowires grown at 1.2 g of the Zn source, attributed to the enhanced refractive index boundaries and optimized structural properties. These findings highlight the potential of ZnO nanowires as high-performance optical diffusers for advanced optoelectronic applications.

Graphical Abstract

{"title":"Enhanced Light-Scattering Properties of Aqueous Chemical Bath Deposited ZnO Nanowires: Influence of Zinc Source Concentration","authors":"Vinaya Kumar Arepalli,&nbsp;Eunyeong Yang,&nbsp;Choong-Heui Chung","doi":"10.1007/s13391-025-00545-z","DOIUrl":"10.1007/s13391-025-00545-z","url":null,"abstract":"<div><p>This study investigates the light-diffusing capabilities of ZnO nanowires synthesized using the aqueous chemical bath deposition method on PET substrates. By systematically varying Zn source concentrations, the morphology and optical performance of ZnO nanowires were tuned. Scanning electron microscopy revealed that nanowires grown at optimal Zn sources (0.75 g and 1.2 g) exhibited sharp tip morphologies, while higher or lower Zn sources led to flatter tips due to isotropic growth or insufficient precursor availability. Optical characterization demonstrated that ZnO nanowires grown at 1.2 g of the Zn source achieved a maximum total transmittance of ~ 58% and a scattering angle of 53°, outperforming commercial optical diffusers. The transmission haze values peaked at 98.5% for nanowires grown at 1.2 g of the Zn source, attributed to the enhanced refractive index boundaries and optimized structural properties. These findings highlight the potential of ZnO nanowires as high-performance optical diffusers for advanced optoelectronic applications.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"177 - 183"},"PeriodicalIF":2.1,"publicationDate":"2025-01-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571119","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Thickness-Dependent Electrical and Optoelectrical Properties of SnSe2 Field-Effect Transistors
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-16 DOI: 10.1007/s13391-025-00544-0
Han-Woong Choi, Dong Hyun Seo, Ji Won Heo, Sang-Il Kim, TaeWan Kim

Two-dimensional semiconductors such as SnSe2 hold great promise for electronic and optoelectronic applications. Factors such as the intrinsic carrier concentration and interfacial scattering strongly influence device performance. In this study, SnSe2-based field-effect transistors were fabricated with precise thickness control by reactive ion etching. Electrical measurements revealed that reducing the thickness from 300 to 21 nm led to an increase in carrier mobility from 3.76 to 26.6 cm² V− 1 s− 1 and an improvement in conductivity from 0.31 to 7.72 S/cm. This enhancement is attributed to a rise in carrier concentration, from 1.48 × 1018 to 1.66 × 1019 cm⁻³, along with better screening of interfacial Coulomb potential. Furthermore, the photoresponsivity varied with thickness, with thinner devices exhibiting a peak of 484 A/W under a 700-nm laser, compared to 260 A/W under a 900-nm laser for thicker devices. These findings highlight the critical role of thickness optimization in fine-tuning the electrical and optoelectronic properties of SnSe2-based devices.

{"title":"Thickness-Dependent Electrical and Optoelectrical Properties of SnSe2 Field-Effect Transistors","authors":"Han-Woong Choi,&nbsp;Dong Hyun Seo,&nbsp;Ji Won Heo,&nbsp;Sang-Il Kim,&nbsp;TaeWan Kim","doi":"10.1007/s13391-025-00544-0","DOIUrl":"10.1007/s13391-025-00544-0","url":null,"abstract":"<div><p>Two-dimensional semiconductors such as SnSe<sub>2</sub> hold great promise for electronic and optoelectronic applications. Factors such as the intrinsic carrier concentration and interfacial scattering strongly influence device performance. In this study, SnSe<sub>2</sub>-based field-effect transistors were fabricated with precise thickness control by reactive ion etching. Electrical measurements revealed that reducing the thickness from 300 to 21 nm led to an increase in carrier mobility from 3.76 to 26.6 cm² V<sup>− 1</sup> s<sup>− 1</sup> and an improvement in conductivity from 0.31 to 7.72 S/cm. This enhancement is attributed to a rise in carrier concentration, from 1.48 × 10<sup>18</sup> to 1.66 × 10<sup>19</sup> cm⁻³, along with better screening of interfacial Coulomb potential. Furthermore, the photoresponsivity varied with thickness, with thinner devices exhibiting a peak of 484 A/W under a 700-nm laser, compared to 260 A/W under a 900-nm laser for thicker devices. These findings highlight the critical role of thickness optimization in fine-tuning the electrical and optoelectronic properties of SnSe<sub>2</sub>-based devices.</p></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"154 - 161"},"PeriodicalIF":2.1,"publicationDate":"2025-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571157","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Phase Transition and Thermoelectric Performance of NixCu12−xSb4Se13
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-07 DOI: 10.1007/s13391-024-00543-7
Sang Jun Park, Il-Ho Kim

Ternary compounds of the Cu–X–Q system (where X = Fe, Sb, Sn and Q = S, Se), such as Cu5FeS4, Cu3SbS4, and Cu2SnSe3, have garnered considerable attention for their potential applications in electronics, optics, and energy technologies. These compounds are noted for their low thermal conductivity and narrow band gaps, making them promising candidates for thermoelectric materials. However, detailed experimental investigations into the phase transitions and thermoelectric properties of synthetic hakite, particularly with Ni substitution, have been limited. This study focused on synthesizing Ni-substituted hakite (NixCu12−xSb4Se13; x = 0.5–2) through mechanical alloying and hot pressing techniques, while also exploring the phase transitions and thermoelectric characteristics as a function of Ni content. Despite the charge compensation effect of Ni, a pure hakite phase could not be achieved. Instead, the resultant phases comprised mixtures of secondary phases including bytizite, pribramite, and permingeatite, or their composites. This indicates that the introduction of Ni into the system did not promote the formation of a single-phase hakite but rather stabilized a multi-phase system. The introduction of Ni resulted in a decrease in electrical conductivity across all specimens. Notably, the materials exhibited non-degenerate semiconductor behavior. The measured Seebeck coefficients were significantly high and positive, confirming p-type behavior. However, these coefficients decreased with increasing temperature. The thermal conductivity of the materials displayed minimal temperature dependence, consistently remaining below 0.65 Wm−1 K−1. This low thermal conductivity is advantageous for thermoelectric efficiency, as it minimizes heat loss while maintaining charge transport. For the composition Ni0.5Cu11.5Sb4Se13, we achieved a maximum power factor of 0.09 mWm−1 K−2 and a peak dimensionless figure of merit (ZT) of 0.18 at 623 K.

Graphical Abstract

{"title":"Phase Transition and Thermoelectric Performance of NixCu12−xSb4Se13","authors":"Sang Jun Park,&nbsp;Il-Ho Kim","doi":"10.1007/s13391-024-00543-7","DOIUrl":"10.1007/s13391-024-00543-7","url":null,"abstract":"<div><p>Ternary compounds of the Cu–X–Q system (where X = Fe, Sb, Sn and Q = S, Se), such as Cu<sub>5</sub>FeS<sub>4</sub>, Cu<sub>3</sub>SbS<sub>4</sub>, and Cu<sub>2</sub>SnSe<sub>3</sub>, have garnered considerable attention for their potential applications in electronics, optics, and energy technologies. These compounds are noted for their low thermal conductivity and narrow band gaps, making them promising candidates for thermoelectric materials. However, detailed experimental investigations into the phase transitions and thermoelectric properties of synthetic hakite, particularly with Ni substitution, have been limited. This study focused on synthesizing Ni-substituted hakite (Ni<sub>x</sub>Cu<sub>12−x</sub>Sb<sub>4</sub>Se<sub>13</sub>; x = 0.5–2) through mechanical alloying and hot pressing techniques, while also exploring the phase transitions and thermoelectric characteristics as a function of Ni content. Despite the charge compensation effect of Ni, a pure hakite phase could not be achieved. Instead, the resultant phases comprised mixtures of secondary phases including bytizite, pribramite, and permingeatite, or their composites. This indicates that the introduction of Ni into the system did not promote the formation of a single-phase hakite but rather stabilized a multi-phase system. The introduction of Ni resulted in a decrease in electrical conductivity across all specimens. Notably, the materials exhibited non-degenerate semiconductor behavior. The measured Seebeck coefficients were significantly high and positive, confirming p-type behavior. However, these coefficients decreased with increasing temperature. The thermal conductivity of the materials displayed minimal temperature dependence, consistently remaining below 0.65 Wm<sup>−1</sup> K<sup>−1</sup>. This low thermal conductivity is advantageous for thermoelectric efficiency, as it minimizes heat loss while maintaining charge transport. For the composition Ni<sub>0.5</sub>Cu<sub>11.5</sub>Sb<sub>4</sub>Se<sub>13</sub>, we achieved a maximum power factor of 0.09 mWm<sup>−1</sup> K<sup>−2</sup> and a peak dimensionless figure of merit (ZT) of 0.18 at 623 K.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"235 - 244"},"PeriodicalIF":2.1,"publicationDate":"2025-01-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143571038","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ultra-Effective Methylene Blue Detection by Nanoporous Gold for Surface-Enhanced Raman Spectroscopy
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-04 DOI: 10.1007/s13391-024-00541-9
Yoonseo Huh, Sangwoo Ryu

This study presents the fabrication and optimization of nanoporous gold (Au) substrates for Surface-Enhanced Raman Spectroscopy (SERS). These substrates were obtained by the high-pressure thermal evaporation method, which utilizes a relatively high pressure of a few Torr to form highly porous structures. These nanoporous structures were induced by homogeneous nucleation and growth of the evaporated metal atoms that occurred through repeated collisions during the deposition process. By controlling deposition pressure and film thickness, optimal conditions to achieve enhanced SERS activity were established. The Au nanoporous structures consisted of randomly connected Au nanoparticles and demonstrated numerous nanogaps between these nanoparticles. These nanogaps act as hot spots of localized surface plasmon resonance, enabling significant amplification of Raman signals. The optimized nanoporous Au substrate, deposited at 2.0 Torr with a thickness of 1.65 μm, achieved a limit of detection (LOD) of 10− 8 M for Rhodamine 6G (R6G). Furthermore, the substrate’s applicability was extended to the detection of methylene blue (MB), an organic dye with known environmental impacts. MB could be detected up to 10− 6 M by using these nanoporous Au substrates for SERS. This work successfully demonstrated the potential of nanoporous Au for SERS as an effective analytical platform for trace-level detection of MB, paving the way for advancements in environmental monitoring and biological sensing applications.

Graphical Abstract

本研究介绍了用于表面增强拉曼光谱(SERS)的纳米多孔金(Au)基底的制造和优化。这些基底是通过高压热蒸发法获得的,该方法利用几托的相对高压形成高多孔结构。这些纳米多孔结构是由蒸发的金属原子在沉积过程中通过反复碰撞产生的均匀成核和生长所诱导的。通过控制沉积压力和薄膜厚度,建立了实现增强 SERS 活性的最佳条件。金纳米多孔结构由随机连接的金纳米颗粒组成,这些纳米颗粒之间有许多纳米间隙。这些纳米间隙是局部表面等离子体共振的热点,可显著放大拉曼信号。经过优化的纳米多孔金基底在 2.0 托的条件下沉积,厚度为 1.65 μm,罗丹明 6G (R6G) 的检测限 (LOD) 为 10- 8 M。此外,该基底的适用性还扩展到了亚甲基蓝(MB)的检测,亚甲基蓝是一种已知对环境有影响的有机染料。通过使用这些用于 SERS 的纳米多孔金基底,可以检测到高达 10- 6 M 的亚甲基蓝。这项工作成功证明了纳米多孔金 SERS 作为痕量甲基溴检测的有效分析平台的潜力,为环境监测和生物传感应用的进步铺平了道路。
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引用次数: 0
Pribramite CuSbSe2: Solid-State Synthesis and Thermoelectric Properties
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-03 DOI: 10.1007/s13391-024-00542-8
Min Ji Choi, Sang Jun Park, Il-Ho Kim

Pribramite (CuSbSe2) is gaining attention as a potential thermoelectric material due to its high thermopower and low thermal conductivity, although it remains relatively underexplored compared to more widely studied thermoelectric compounds. This study focused on optimizing the synthesis and sintering processes of CuSbSe2 using mechanical alloying (MA) and hot pressing (HP) methods to enhance its thermoelectric performance. The desired pribramite phase was successfully synthesized in both mechanically alloyed powders and hot-pressed specimens, though secondary phases such as bytizite (Cu3SbSe3) and permingeatite (Cu3SbSe4) were identified. Thermogravimetric and differential scanning calorimetry analyses indicated a melting point for CuSbSe2 between 723 and 728 K. Densely sintered samples achieved high relative densities of 98.6–99.4% through the MA–HP process. Electrical characterization revealed non-degenerate semiconductor behavior with temperature-dependent conductivity. Seebeck coefficient measurements confirmed p-type semiconductor characteristics, with holes as the major charge carriers. An intrinsic transition in the Seebeck coefficient was observed, with the transition temperature decreasing as the HP temperature increased. A maximum power factor of 0.23 mWm−1 K−2 was achieved at 623 K, while thermal conductivity steadily decreased across the measured temperature range of 323 K to 623 K. The highest dimensionless figure of merit (ZT) reached 0.28 at 623 K, indicating promising thermoelectric potential for CuSbSe2.

Graphical Abstract

Pribramite (CuSbSe2)作为一种潜在的热电材料,因其热功率高、热导率低而日益受到关注,但与研究更广泛的热电化合物相比,它的研究仍相对不足。本研究的重点是利用机械合金化(MA)和热压(HP)方法优化 CuSbSe2 的合成和烧结过程,以提高其热电性能。在机械合金粉末和热压试样中都成功合成了所需的普氏相,但也发现了副沸石(Cu3SbSe3)和孔雀石(Cu3SbSe4)等次生相。热重分析和差示扫描量热分析表明,CuSbSe2 的熔点在 723 至 728 K 之间。通过 MA-HP 工艺,致密烧结样品达到了 98.6-99.4% 的高相对密度。电学特性分析表明,这种非退化半导体具有随温度变化的导电性。塞贝克系数测量证实了以空穴为主要电荷载流子的 p 型半导体特性。观察到塞贝克系数的内在转变,转变温度随着 HP 温度的升高而降低。在 623 K 时,功率因数达到最大值 0.23 mWm-1 K-2,而热导率在 323 K 至 623 K 的测量温度范围内稳步下降。
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引用次数: 0
Correction: Rapid Thermal Annealing Under O2 Ambient to Recover the Deterioration by Gamma-Ray Irradiation in a-IGZO TFTs
IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-01-02 DOI: 10.1007/s13391-024-00536-6
Minah Park, Jaewook Yoo, Hongseung Lee, Hyeonjun Song, Soyeon Kim, Seongbin Lim, Seohyeon Park, Jo Hak Jeong, Bongjoong Kim, Kiyoung Lee, Yoon Kyeung Lee, Keun Heo, Jiseok Kwon, Hagyoul Bae
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引用次数: 0
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Electronic Materials Letters
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