基于0.18um 6金属CMOS工艺的ADI公司雷达接收路径模拟前端(AFE)放大器故障局部区域的阿瓦隆辅助映射

Arnulfo Evangelista, Janella Alfelor-Igtiben, John David Mangali, Khristopherson Cajucom
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摘要

ADI公司的雷达接收路径模拟前端放大器(AFE)采用0.18um 6金属晶圆工艺,其故障与断电和扫描测试参数有关,这些参数已被认可用于故障分析。由于断层定位涉及6个金属层,因此非常具有挑战性。这已经通过synosis Avalon软件的可用性得到了解决,该软件能够转换完整的Cadence原理图和可用于故障分析的布局,通过与实际拒绝部件上的故障局部感兴趣区域(AOI)的交叉映射,以及模具原理图和布局,并识别故障组件和电路块。这导致与所报告的失效模式相关的失效模型的创建,以及与相邻金属化层之间的制造缺陷和多晶硅与衬底层之间的缺陷相关的适当失效机制的确定。这有助于加快FA周期时间并实现准确的故障机制,从而解决fab工艺所有者的晶圆厂缺陷问题。
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Avalon-Aided Mapping of Fault-Localized Area of ADI’s RADAR Receive Path Analog Front-End (AFE) Amplifier with 0.18um 6-Metal CMOS Fab Process
Abstract Analog Devices Inc. (ADI)’s Radar Receive Path Analog Front End Amplifier (AFE) with a 0.18um 6-metal Fab Process has failures related to Power-Down and Scan test parameters which were endorsed for Failure Analysis. Fault localization is quite challenging because it involves 6 metal layers. This has been resolved with the availability of Synopsis Avalon software with capability to convert the complete Cadence schematics and layout that is usable for Failure Analysis, through cross-mapping with the fault localized area-of-interest (AOI) on the actual reject part with the die schematics and layout, and identifying the failing component and circuit block. This leads to the creation of the failure model related to the reported failure mode and the determination of the appropriate failure mechanism related to fabrication defects between the adjacent metallization layers and defects on between the polysilicon and substrate layer. This helps speed up the FA Cycle Time and achieve an accurate failure mechanism, which later resolves the fab defect issue with the Fab process owner.
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