局部原位沉积:超快激光烧蚀制备表面微纳结构的一个新的控制维度。

IF 4.1 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Frontiers of Optoelectronics Pub Date : 2023-11-17 DOI:10.1007/s12200-023-00092-1
Peixun Fan, Guochen Jiang, Xinyu Hu, Lizhong Wang, Hongjun Zhang, Minlin Zhong
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引用次数: 0

摘要

表面微纳结构的可控制造是实现各种应用表面功能化的关键。超快激光烧蚀作为一种通用的表面微纳结构制备方法得到了广泛的研究。这一领域越来越多的研究努力致力于获得对制造过程的更多控制,以满足日益增长的复杂结构创造的需求。本文主要研究了超快激光烧蚀下等离子体形成后的原位沉积过程。从概述的角度,我们首先总结了脉冲激光烧蚀固体的等离子体羽流在不同激光加工方法中所起的不同作用。然后,重点介绍了表面微纳结构中独特的原位沉积工艺。我们的实验工作表明,在超快激光表面结构过程中,原位沉积可以作为一个局部的微添加过程来控制,以堆积二级有序结构,通过这种过程可以制造出一种独特的分层结构,这种结构具有位于微锥阵列顶部的堡垒状体作为展示。所揭示的激光-物质相互作用机制可以激发新的超快激光制造方法的发展,为控制功能表面微纳结构的制造增加了新的维度和更大的灵活性。
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Localized in-situ deposition: a new dimension to control in fabricating surface micro/nano structures via ultrafast laser ablation.

Controllable fabrication of surface micro/nano structures is the key to realizing surface functionalization for various applications. As a versatile approach, ultrafast laser ablation has been widely studied for surface micro/nano structuring. Increasing research efforts in this field have been devoted to gaining more control over the fabrication processes to meet the increasing need for creation of complex structures. In this paper, we focus on the in-situ deposition process following the plasma formation under ultrafast laser ablation. From an overview perspective, we firstly summarize the different roles that plasma plumes, from pulsed laser ablation of solids, play in different laser processing approaches. Then, the distinctive in-situ deposition process within surface micro/nano structuring is highlighted. Our experimental work demonstrated that the in-situ deposition during ultrafast laser surface structuring can be controlled as a localized micro-additive process to pile up secondary ordered structures, through which a unique kind of hierarchical structure with fort-like bodies sitting on top of micro cone arrays were fabricated as a showcase. The revealed laser-matter interaction mechanism can be inspiring for the development of new ultrafast laser fabrication approaches, adding a new dimension and more flexibility in controlling the fabrication of functional surface micro/nano structures.

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来源期刊
Frontiers of Optoelectronics
Frontiers of Optoelectronics ENGINEERING, ELECTRICAL & ELECTRONIC-
CiteScore
7.80
自引率
0.00%
发文量
583
期刊介绍: Frontiers of Optoelectronics seeks to provide a multidisciplinary forum for a broad mix of peer-reviewed academic papers in order to promote rapid communication and exchange between researchers in China and abroad. It introduces and reflects significant achievements being made in the field of photonics or optoelectronics. The topics include, but are not limited to, semiconductor optoelectronics, nano-photonics, information photonics, energy photonics, ultrafast photonics, biomedical photonics, nonlinear photonics, fiber optics, laser and terahertz technology and intelligent photonics. The journal publishes reviews, research articles, letters, comments, special issues and so on. Frontiers of Optoelectronics especially encourages papers from new emerging and multidisciplinary areas, papers reflecting the international trends of research and development, and on special topics reporting progress made in the field of optoelectronics. All published papers will reflect the original thoughts of researchers and practitioners on basic theories, design and new technology in optoelectronics. Frontiers of Optoelectronics is strictly peer-reviewed and only accepts original submissions in English. It is a fully OA journal and the APCs are covered by Higher Education Press and Huazhong University of Science and Technology. ● Presents the latest developments in optoelectronics and optics ● Emphasizes the latest developments of new optoelectronic materials, devices, systems and applications ● Covers industrial photonics, information photonics, biomedical photonics, energy photonics, laser and terahertz technology, and more
期刊最新文献
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