n2 - dbd等离子体环境下氮掺杂石墨烯及其中性物质的作用

IF 2.9 3区 物理与天体物理 Q2 PHYSICS, APPLIED Plasma Processes and Polymers Pub Date : 2023-11-23 DOI:10.1002/ppap.202300168
Alina Begley, Giovanni Luca Bartolomeo, Daniel F. Abbott, Victor Mougel, Renato Zenobi
{"title":"n2 - dbd等离子体环境下氮掺杂石墨烯及其中性物质的作用","authors":"Alina Begley, Giovanni Luca Bartolomeo, Daniel F. Abbott, Victor Mougel, Renato Zenobi","doi":"10.1002/ppap.202300168","DOIUrl":null,"url":null,"abstract":"We doped nitrogen into monolayer graphene using reactive nitrogen species from a dielectric barrier discharge (DBD). After 30 s of treatment, the graphene monolayer had a moderate degree of damage (<i>I</i><sub>D</sub>/<i>I</i><sub>G</sub> = 1.2) and an increase in the N-atom (pyrrolic) and O-atom (mixed) content. During long treatment times (20 min), the treated area increased radially and the graphene was destroyed. Overall, the N-atom content increased with increasing operating voltage of the DBD source. When the graphene was treated with only neutral reactive nitrogen species, the N-atom content and type remained unchanged. Therefore, we hypothesize that the primary reactive species resulting in pyrrolic N-doping from the DBD are neutrals such as N(<sup>4</sup>S) and possibly N(<sup>2</sup>P).","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"78 6","pages":""},"PeriodicalIF":2.9000,"publicationDate":"2023-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Nitrogen-doping graphene at ambient conditions with N2-DBD-plasma and the role of neutral species\",\"authors\":\"Alina Begley, Giovanni Luca Bartolomeo, Daniel F. Abbott, Victor Mougel, Renato Zenobi\",\"doi\":\"10.1002/ppap.202300168\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We doped nitrogen into monolayer graphene using reactive nitrogen species from a dielectric barrier discharge (DBD). After 30 s of treatment, the graphene monolayer had a moderate degree of damage (<i>I</i><sub>D</sub>/<i>I</i><sub>G</sub> = 1.2) and an increase in the N-atom (pyrrolic) and O-atom (mixed) content. During long treatment times (20 min), the treated area increased radially and the graphene was destroyed. Overall, the N-atom content increased with increasing operating voltage of the DBD source. When the graphene was treated with only neutral reactive nitrogen species, the N-atom content and type remained unchanged. Therefore, we hypothesize that the primary reactive species resulting in pyrrolic N-doping from the DBD are neutrals such as N(<sup>4</sup>S) and possibly N(<sup>2</sup>P).\",\"PeriodicalId\":20135,\"journal\":{\"name\":\"Plasma Processes and Polymers\",\"volume\":\"78 6\",\"pages\":\"\"},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2023-11-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Plasma Processes and Polymers\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1002/ppap.202300168\",\"RegionNum\":3,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Processes and Polymers","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1002/ppap.202300168","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0

摘要

我们利用来自介质阻挡放电(DBD)的活性氮物质将氮掺杂到单层石墨烯中。处理30 s后,单层石墨烯发生中等程度的损伤(ID/IG = 1.2), n原子(吡啶)和o原子(混合)含量增加。在较长的处理时间内(20分钟),处理面积呈放射状增加,石墨烯被破坏。总体而言,随着DBD源工作电压的增加,n原子含量增加。当仅用中性活性氮处理石墨烯时,n原子的含量和类型保持不变。因此,我们假设从DBD中导致吡咯烷N掺杂的主要反应物质是N(4S)和可能的N(2P)等中性物质。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

摘要图片

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Nitrogen-doping graphene at ambient conditions with N2-DBD-plasma and the role of neutral species
We doped nitrogen into monolayer graphene using reactive nitrogen species from a dielectric barrier discharge (DBD). After 30 s of treatment, the graphene monolayer had a moderate degree of damage (ID/IG = 1.2) and an increase in the N-atom (pyrrolic) and O-atom (mixed) content. During long treatment times (20 min), the treated area increased radially and the graphene was destroyed. Overall, the N-atom content increased with increasing operating voltage of the DBD source. When the graphene was treated with only neutral reactive nitrogen species, the N-atom content and type remained unchanged. Therefore, we hypothesize that the primary reactive species resulting in pyrrolic N-doping from the DBD are neutrals such as N(4S) and possibly N(2P).
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Plasma Processes and Polymers
Plasma Processes and Polymers 物理-高分子科学
CiteScore
6.60
自引率
11.40%
发文量
150
审稿时长
3 months
期刊介绍: Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.
期刊最新文献
Electrophoretic Deposition of Multi‐Walled Carbon Nanotubes: The Key Role of Plasma Functionalization and Polymerization Issue Information: Plasma Process. Polym. 9/2024 Outside Front Cover: Plasma Process. Polym. 9/2024 Effect of the pH on the Formation of Gold Nanoparticles Enabled by Plasma‐Driven Solution Electrochemistry Effects of cold atmospheric plasma‐treated medium on HaCaT and HUVEC cells in vitro
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1