Clément Lausecker, David Muñoz-Rojas, Matthieu Weber
{"title":"钯原子层沉积(ALD):从工艺到应用","authors":"Clément Lausecker, David Muñoz-Rojas, Matthieu Weber","doi":"10.1080/10408436.2023.2273463","DOIUrl":null,"url":null,"abstract":"Atomic layer deposition (ALD) has been successfully used for the deposition of palladium (Pd) thin films and nanostructures, with a wide range of applications in fields such as microelectronics, en...","PeriodicalId":55203,"journal":{"name":"Critical Reviews in Solid State and Materials Sciences","volume":"20 1","pages":""},"PeriodicalIF":8.1000,"publicationDate":"2023-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Atomic layer deposition (ALD) of palladium: from processes to applications\",\"authors\":\"Clément Lausecker, David Muñoz-Rojas, Matthieu Weber\",\"doi\":\"10.1080/10408436.2023.2273463\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Atomic layer deposition (ALD) has been successfully used for the deposition of palladium (Pd) thin films and nanostructures, with a wide range of applications in fields such as microelectronics, en...\",\"PeriodicalId\":55203,\"journal\":{\"name\":\"Critical Reviews in Solid State and Materials Sciences\",\"volume\":\"20 1\",\"pages\":\"\"},\"PeriodicalIF\":8.1000,\"publicationDate\":\"2023-11-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Critical Reviews in Solid State and Materials Sciences\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1080/10408436.2023.2273463\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Critical Reviews in Solid State and Materials Sciences","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1080/10408436.2023.2273463","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Atomic layer deposition (ALD) of palladium: from processes to applications
Atomic layer deposition (ALD) has been successfully used for the deposition of palladium (Pd) thin films and nanostructures, with a wide range of applications in fields such as microelectronics, en...
期刊介绍：
Critical Reviews in Solid State and Materials Sciences covers a wide range of topics including solid state materials properties, processing, and applications. The journal provides insights into the latest developments and understandings in these areas, with an emphasis on new and emerging theoretical and experimental topics. It encompasses disciplines such as condensed matter physics, physical chemistry, materials science, and electrical, chemical, and mechanical engineering. Additionally, cross-disciplinary engineering and science specialties are included in the scope of the journal.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
