在 5 纳米技术中实现 4.24-GHz 128×256 SRAM 双泵读写同周期运行

IF 2.2 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE IEEE Solid-State Circuits Letters Pub Date : 2023-11-27 DOI:10.1109/LSSC.2023.3336773
Nick Zhang;Young Suk Kim;Peter Hsu;Samsoo Kim;Derek Tao;Hung-Jen Liao;P. W. Wang;Geoffrey Yeap;Quincy Li;Tsung-Yung Jonathan Chang
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引用次数: 0

摘要

提出了一种高速高密度1R1W双端口32Kbit ($128\ × 256$)单端口6T位元宏SRAM。为了提高读写性能,提出了一种采用跟踪位线(TRKBL)旁路的RTW双泵CLK产生电路。在感应放大器中引入了局部联锁电路(LIC),以降低有功功率并进一步提高Fmax。为了减轻金属RC的退化,采用了双金属方案来提高信号的完整性和提高整体运行周期时间。结果表明,在5纳米FinFET技术中,慢角晶片能够在1.0 V/100°C下实现4.24 GHz。
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A 4.24-GHz 128×256 SRAM Operating Double Pump Read Write Same Cycle in 5-nm Technology
A High-Speed High-Density 1R1W two port 32Kbit ( $128\times 256$ ) SRAM with single port 6T bitcell macro is proposed. A read-then-write (RTW) double pump CLK generation circuit with tracking bitline (TRKBL) bypassing is proposed to boost read and write performance. A local interlock circuit (LIC) is introduced in Sense-Amp to reduce active power and push Fmax further. To mitigate metal RC degradation, double metal scheme is applied to improve signal integrity and enhance overall operating cycle time. The silicon results show that the slow corner wafer was able to achieve 4.24 GHz at 1.0 V/100 °C in 5-nm FinFET technology.
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来源期刊
IEEE Solid-State Circuits Letters
IEEE Solid-State Circuits Letters Engineering-Electrical and Electronic Engineering
CiteScore
4.30
自引率
3.70%
发文量
52
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