{"title":"石英晶体微天平 (QCM) 法研究聚（4-羟基苯乙烯）（PHS）和四甲基氢氧化铵（TMAH）在 TMAH 水溶液中形成 PHS 薄膜过程中的浓度关系","authors":"Yuko Tsutsui Ito, Kyoko Watanabe, Yuqing Jin, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu","doi":"10.35848/1347-4065/ad17dd","DOIUrl":null,"url":null,"abstract":"\n The development (the dissolution of resist films in developer) is an important process of lithography. However, the details of the dissolution of resist polymers remain unclarified. In this study, the viscosity of 2.38 wt% tetramethylammonium hydroxide (TMAH) aqueous solution with poly(4-hydroxystyrene) (PHS) was investigated by a quartz crystal microbalance method. The relationship between PHS concentration and the viscosity of 2.38 wt% TMAH aqueous solution with PHS was measured. The kinetics (temporal change) of viscosity and PHS concentration during development was clarified. The maximum PHS concentration reachable during development approximately corresponded to the TMAH concentration independently of the film thickness.","PeriodicalId":14741,"journal":{"name":"Japanese Journal of Applied Physics","volume":"25 10","pages":""},"PeriodicalIF":1.5000,"publicationDate":"2023-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Relationship between poly(4-hydroxystyrene) (PHS) and tetramethylammonium hydroxide (TMAH) concentrations during the development of PHS films in TMAH aqueous solution studied by quartz crystal microbalance (QCM) method\",\"authors\":\"Yuko Tsutsui Ito, Kyoko Watanabe, Yuqing Jin, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu\",\"doi\":\"10.35848/1347-4065/ad17dd\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\n The development (the dissolution of resist films in developer) is an important process of lithography. However, the details of the dissolution of resist polymers remain unclarified. In this study, the viscosity of 2.38 wt% tetramethylammonium hydroxide (TMAH) aqueous solution with poly(4-hydroxystyrene) (PHS) was investigated by a quartz crystal microbalance method. The relationship between PHS concentration and the viscosity of 2.38 wt% TMAH aqueous solution with PHS was measured. The kinetics (temporal change) of viscosity and PHS concentration during development was clarified. The maximum PHS concentration reachable during development approximately corresponded to the TMAH concentration independently of the film thickness.\",\"PeriodicalId\":14741,\"journal\":{\"name\":\"Japanese Journal of Applied Physics\",\"volume\":\"25 10\",\"pages\":\"\"},\"PeriodicalIF\":1.5000,\"publicationDate\":\"2023-12-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Japanese Journal of Applied Physics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.35848/1347-4065/ad17dd\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Japanese Journal of Applied Physics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.35848/1347-4065/ad17dd","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
Relationship between poly(4-hydroxystyrene) (PHS) and tetramethylammonium hydroxide (TMAH) concentrations during the development of PHS films in TMAH aqueous solution studied by quartz crystal microbalance (QCM) method
The development (the dissolution of resist films in developer) is an important process of lithography. However, the details of the dissolution of resist polymers remain unclarified. In this study, the viscosity of 2.38 wt% tetramethylammonium hydroxide (TMAH) aqueous solution with poly(4-hydroxystyrene) (PHS) was investigated by a quartz crystal microbalance method. The relationship between PHS concentration and the viscosity of 2.38 wt% TMAH aqueous solution with PHS was measured. The kinetics (temporal change) of viscosity and PHS concentration during development was clarified. The maximum PHS concentration reachable during development approximately corresponded to the TMAH concentration independently of the film thickness.
期刊介绍：
The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP).
JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields:
• Semiconductors, dielectrics, and organic materials
• Photonics, quantum electronics, optics, and spectroscopy
• Spintronics, superconductivity, and strongly correlated materials
• Device physics including quantum information processing
• Physics-based circuits and systems
• Nanoscale science and technology
• Crystal growth, surfaces, interfaces, thin films, and bulk materials
• Plasmas, applied atomic and molecular physics, and applied nuclear physics
• Device processing, fabrication and measurement technologies, and instrumentation
• Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS
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