薄膜的 X 射线光电子能谱表征概述

Q4 Earth and Planetary Sciences Research Journal of Chemistry and Environment Pub Date : 2023-12-05 DOI:10.25303/281rjce1420160
Soonmin Ho, A.G. Jacob
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引用次数: 0

摘要

许多研究人员都报道过纳米结构薄膜的制备和表征。几十年来,X 射线光电子能谱(XPS)方法已被用于超导体、半导体、冶金和催化等不同领域。本研究对金属硫化物、金属硒化物、金属氧化物和金属碲薄膜的元素氧化态、电子态、化学结构和化学成分进行了研究。报告还对所获样品的结合能进行了评估。XPS 光谱显示,退火处理对薄膜的成分有很大影响。元素的氧化态和电子态与特定的实验条件密切相关。
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A brief overview of X-ray photoelectron spectroscopy characterization of thin films
Preparation and characterization of nanostructured thin films have been reported by many researchers. X-ray photoelectron spectroscopy (XPS) method has been used over few decades in different fields such as superconductor, semiconductor, metallurgy and catalysis. In this work, elemental oxidation state, electronic state, chemical structure and chemical composition were investigated for metal sulfide, metal selenide, metal oxide and metal telluride films. Evaluation of binding energy for the obtained samples was reported. XPS spectra showed that annealing treatment has a very strong effect on the composition of the films. The elemental oxidation state and electronic state were strongly dependent on the specific experimental conditions.
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CiteScore
0.50
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195
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4-8 weeks
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