具有 SnSe 纳米结构的可见光范围和自供电光电探测器:铜浓度和超声波辐照对光电性能的影响

IF 4.1 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Sensors and Actuators A-physical Pub Date : 2023-12-23 DOI:10.1016/j.sna.2023.114961
Mohammad Gharibshahi , Farid Jamali-Sheini , Ramin Yousefi
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引用次数: 0

摘要

最近对硒化锡(SnSe)纳米结构的研究主要集中在其热电性能上,对其光电潜力的关注有限。在本研究中,我们研究了掺杂不同程度的铜并暴露于超声辐射下的硒化锡纳米结构的物理和光电特性。结果表明,增加掺杂元素的摩尔数和利用超声辐照不仅能降低应力和应变,还能增加晶粒尺寸。例如,与纯 SnSe 相比,掺杂和超声波辐照的结晶尺寸分别显著增加到 36.08 nm 和 45.70 nm。场发射扫描电子显微镜(FESEM)结果表明,在所有样品中都存在纳米棒和分散的团聚颗粒。超声辐照的掺杂程度和相关参数对这些纳米结构的形状有很大影响。光致发光(PL)分析表明,这些影响参数会导致发射带的移动及其强度的变化。200-1100 纳米范围内的吸收光谱测量显示,由于有效参数的影响,吸收增加。此外,光能带隙(Eg)的变化表明,它在 1 至 1.68 eV 范围内得到了增强。I-V 特性结果表明,这些影响参数有助于提高响应率(0.369 至 0.467 mA/W)和灵敏度(572% 至 1826%)。比检出率从 2.90 到 10.60×10+9 Jones。这些有效参数还对迁移率、意向系数和载流子浓度产生了有利影响。
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Visible-range and self-powered photodetectors with SnSe nanostructures: The influence of copper concentrations and ultrasound waves irradiation on optoelectronic performance

Recent studies on tin selenide (SnSe) nanostructures have primarily focused on their thermoelectric performance, with limited attention given to their optoelectronic potential. In this study, we investigate the physical and optoelectronic properties of SnSe nanostructures with varying concentration of Cu doping and exposure to ultrasound radiation. The results reveal that increasing the concentration of the dopant element and utilizing ultrasound irradiation not only led to reduced stress and strain but also led to an increase in crystallite size. For instance, crystallite size increased dramatically up to 8.96 nm and 17.54 nm for doping and radiation of ultrasound waves in comparison to the undoped SnSe, respectively. Field emission scanning electron microscopy (FESEM) results indicate the presence of nanorods accompanied by agglomerated particles dispersed throughout all samples. The extent of doping and the parameters related to ultrasound irradiation significantly influence the shapes of these nanostructures. Photoluminescence (PL) analysis demonstrates that these influential parameters cause shifts in emission bands and changes in their intensity. Absorption spectra measurements in the range of 200–1100 nm reveal an increase in absorption due to the influence of effective parameters. Furthermore, alterations in the optical energy band gap (Eg) indicate that it enhanced within the range of 1 to 1.68 eV. The I-V characteristics results show that these influential parameters contribute to the enhancement of responsivity (0.369 to 0.467 mA/W) and sensitivity (572% to 1826%). The specific detectivity ranges from 2.90 to 10.60 × 10+9 Jones. These effective parameters also have a favorable impact on mobility, ideality factor, and carrier concentration.

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来源期刊
Sensors and Actuators A-physical
Sensors and Actuators A-physical 工程技术-工程:电子与电气
CiteScore
8.10
自引率
6.50%
发文量
630
审稿时长
49 days
期刊介绍: Sensors and Actuators A: Physical brings together multidisciplinary interests in one journal entirely devoted to disseminating information on all aspects of research and development of solid-state devices for transducing physical signals. Sensors and Actuators A: Physical regularly publishes original papers, letters to the Editors and from time to time invited review articles within the following device areas: • Fundamentals and Physics, such as: classification of effects, physical effects, measurement theory, modelling of sensors, measurement standards, measurement errors, units and constants, time and frequency measurement. Modeling papers should bring new modeling techniques to the field and be supported by experimental results. • Materials and their Processing, such as: piezoelectric materials, polymers, metal oxides, III-V and II-VI semiconductors, thick and thin films, optical glass fibres, amorphous, polycrystalline and monocrystalline silicon. • Optoelectronic sensors, such as: photovoltaic diodes, photoconductors, photodiodes, phototransistors, positron-sensitive photodetectors, optoisolators, photodiode arrays, charge-coupled devices, light-emitting diodes, injection lasers and liquid-crystal displays. • Mechanical sensors, such as: metallic, thin-film and semiconductor strain gauges, diffused silicon pressure sensors, silicon accelerometers, solid-state displacement transducers, piezo junction devices, piezoelectric field-effect transducers (PiFETs), tunnel-diode strain sensors, surface acoustic wave devices, silicon micromechanical switches, solid-state flow meters and electronic flow controllers. Etc...
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