Kazuki Komiya, Koki Nagata, Hidehiko Yamaoka, Shuichi Date, Yuito Miyashita, Min Yan
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引用次数: 0
摘要
微细加工技术的进步使电子束光刻（EB）系统能够制造出 10 纳米数量级的微细加工产品。利用这项技术，我们制造出了纳米间隙电极，可以在低电压下产生大电场。制作的电极尖端之间的间隙为 100 纳米，每个尖端的曲率为 50 纳米。经证实，该装置可用作电子真空计，在电极电压为 3 V 时，可成功测量 10-3 至 1 Pa 的真空度。
Investigation of vacuum measurement by nano-gap device
Advances in microfabrication technology have enabled electron beam lithography (EB lithography) systems to produce microfabrication on the order of 10 of nanometers. Using this technology, we have fabricated nanogap electrodes that can generate large electric fields at low voltages. The gap between the tips of the fabricated electrodes is 100 nm, and the curvature of each tip is 50 nm. The device was confirmed to work as an electronic vacuum gauge, the device successfully measured vacuum from 10−3 to 1 Pa at the electrode voltage of 3 V.
期刊介绍：
Electronics and Communications in Japan (ECJ) publishes papers translated from the Transactions of the Institute of Electrical Engineers of Japan 12 times per year as an official journal of the Institute of Electrical Engineers of Japan (IEEJ). ECJ aims to provide world-class researches in highly diverse and sophisticated areas of Electrical and Electronic Engineering as well as in related disciplines with emphasis on electronic circuits, controls and communications. ECJ focuses on the following fields:
- Electronic theory and circuits,
- Control theory,
- Communications,
- Cryptography,
- Biomedical fields,
- Surveillance,
- Robotics,
- Sensors and actuators,
- Micromachines,
- Image analysis and signal analysis,
- New materials.
For works related to the science, technology, and applications of electric power, please refer to the sister journal Electrical Engineering in Japan (EEJ).
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