具有高保持力和高速性能的单纳米 CoFeB/MgO 磁性隧道结

Junta Igarashi, Butsurin Jinnai, Kyota Watanabe, Takanobu Shinoda, Takuya Funatsu, Hideo Sato, Shunsuke Fukami, Hideo Ohno
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引用次数: 0

摘要

使磁性隧道结(MTJ)的尺寸更小,同时满足性能要求,这对未来采用自旋转移力矩磁阻随机存取存储器(STT-MRAM)的电子产品至关重要。然而,传统的 MTJ 采用薄薄的 CoFeB 自由层和 MgO 层,在较小的尺度上满足所需的数据保留和开关速度越来越困难,因此具有挑战性。在这里,我们报告了使用由 CoFeB/MgO 多层组成的自由层的单纳米 MTJ,其中 CoFeB/MgO 接口的数量和/或 CoFeB 厚度可根据要求高数据保留或高速能力的应用来定制器件性能。我们制造出了小至 2.0 纳米的超小型 MTJ,并在 5 纳米以下的 MTJ 中展示了高数据保持率(超过 10 年)和 10 毫微秒或以下的高速开关。这里提出的堆栈设计证明,超小型 CoFeB/MgO MTJ 具有实现高性能和高密度 STT-MRAM 的潜力。
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Single-nanometer CoFeB/MgO magnetic tunnel junctions with high-retention and high-speed capabilities
Making magnetic tunnel junctions (MTJs) smaller while meeting performance requirements is critical for future electronics with spin-transfer torque magnetoresistive random access memory (STT-MRAM). However, it is challenging in the conventional MTJs using a thin CoFeB free layer capped with an MgO layer because of increasing difficulties in satisfying the required data retention and switching speed at smaller scales. Here we report single-nanometer MTJs using a free layer consisting of CoFeB/MgO multilayers, where the number of CoFeB/MgO interfaces and/or the CoFeB thicknesses are engineered to tailor device performance to applications requiring high-data retention or high-speed capability. We fabricate ultra-small MTJs down to 2.0 nm and show high data retention (over 10 years) and high-speed switching at 10 ns or below in sub-5-nm MTJs. The stack design proposed here proves that ultra-small CoFeB/MgO MTJs hold the potential for high-performance and high-density STT-MRAM.
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