镓基 III-V 族化合物半导体单次脉冲激光烧蚀的脉冲持续时间相关性

Laser Damage Pub Date : 2023-11-24 DOI:10.1117/12.2685122
Marnix Vreugdenhil, Dries van Oosten
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摘要

我们通过实验研究了单次激光烧蚀 GaSb、GaAs、GaP 和 GaN 的情况,激光脉冲持续时间从 200 fs 到 20 ps 不等。我们发现 GaSb 的激光烧蚀阈值流量几乎与脉冲持续时间无关,而 GaN 的烧蚀阈值则与脉冲持续时间密切相关。一般来说,我们发现带隙越大,脉冲持续时间的依赖性就越强。这是意料之中的,因为当带隙与光子能量相比较小时,本征激光吸收主要是线性的,而带隙越大,需要的场电离就越强。因此,与较小的带隙相比,较大的带隙对脉冲峰值强度的影响更大,因此对脉冲持续时间的依赖性也更强。
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Pulse duration dependence of single-shot pulsed laser ablation of gallium based III-V compound semiconductors
We experimentally study single-shot laser ablation of GaSb, GaAs, GaP and GaN, for laser pulse durations ranging from 200 fs to 20 ps. We find that the laser ablation threshold fluence of GaSb is almost independent of pulse duration, whereas the ablation threshold for GaN depends strongly on pulse duration. More generally we find that the larger the bandgap, the stronger the dependence of pulse duration. This is expected, as intrinsic laser absorption is mainly linear when the bandgap is small compared to the photon energy, whereas a larger bandgap requires strong field ionization. Thus a larger bandgap leads to a stronger influence of the peak intensity of the pulse and therefore a stronger dependence on the pulse duration, when compared to smaller bandgaps.
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