用于高效光电化学水氧化的 n-Si/SiOx/CoOx-Mo 光阳极(第 3/2024 号小论文)

IF 13 2区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY Small Pub Date : 2024-01-18 DOI:10.1002/smll.202470026
Shuyang Peng, Di Liu, Keyu An, Zhiqin Ying, Mingpeng Chen, Jinxian Feng, Kin Ho Lo, Hui Pan
{"title":"用于高效光电化学水氧化的 n-Si/SiOx/CoOx-Mo 光阳极(第 3/2024 号小论文)","authors":"Shuyang Peng,&nbsp;Di Liu,&nbsp;Keyu An,&nbsp;Zhiqin Ying,&nbsp;Mingpeng Chen,&nbsp;Jinxian Feng,&nbsp;Kin Ho Lo,&nbsp;Hui Pan","doi":"10.1002/smll.202470026","DOIUrl":null,"url":null,"abstract":"<p><b>Photoelectrochemical Water Oxidation</b></p><p>In article number 2304376, Kin Ho Lo, Hui Pan, and co-workers report a metal-insulator-semiconductor (MIS) structure photoanode (n-Si/SiO<sub>x</sub>/CoO<sub>x</sub>-Mo) to show a high photovoltage of 650 mV, saturation current density of 27.6 mA cm<sup>−2</sup>, and fill factor of 0.62 in 1.0 M K<sub>3</sub>BO<sub>3</sub> because the energy barrier, charge transfer, reaction kinetics, and active sites are dramatically increased by the Mo-incorporation. And the Mo-incorporated photoanode is also highly stable.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":228,"journal":{"name":"Small","volume":null,"pages":null},"PeriodicalIF":13.0000,"publicationDate":"2024-01-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/smll.202470026","citationCount":"0","resultStr":"{\"title\":\"n-Si/SiOx/CoOx-Mo Photoanode for Efficient Photoelectrochemical Water Oxidation (Small 3/2024)\",\"authors\":\"Shuyang Peng,&nbsp;Di Liu,&nbsp;Keyu An,&nbsp;Zhiqin Ying,&nbsp;Mingpeng Chen,&nbsp;Jinxian Feng,&nbsp;Kin Ho Lo,&nbsp;Hui Pan\",\"doi\":\"10.1002/smll.202470026\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><b>Photoelectrochemical Water Oxidation</b></p><p>In article number 2304376, Kin Ho Lo, Hui Pan, and co-workers report a metal-insulator-semiconductor (MIS) structure photoanode (n-Si/SiO<sub>x</sub>/CoO<sub>x</sub>-Mo) to show a high photovoltage of 650 mV, saturation current density of 27.6 mA cm<sup>−2</sup>, and fill factor of 0.62 in 1.0 M K<sub>3</sub>BO<sub>3</sub> because the energy barrier, charge transfer, reaction kinetics, and active sites are dramatically increased by the Mo-incorporation. And the Mo-incorporated photoanode is also highly stable.\\n\\n <figure>\\n <div><picture>\\n <source></source></picture><p></p>\\n </div>\\n </figure></p>\",\"PeriodicalId\":228,\"journal\":{\"name\":\"Small\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":13.0000,\"publicationDate\":\"2024-01-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://onlinelibrary.wiley.com/doi/epdf/10.1002/smll.202470026\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Small\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/smll.202470026\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Small","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/smll.202470026","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

光电化学水氧化在文章编号 2304376 中,Kin Ho Lo、Hui Pan 及其合作者报告了一种金属绝缘体-半导体(MIS)结构光阳极(n-Si/SiOx/CoOx-Mo),由于掺入 Mo,其在 1.0 M K3BO3 中的能垒、电荷转移、反应动力学和活性位点均显著增加,因此光阳极的光电电压高达 650 mV,饱和电流密度为 27.6 mA cm-2,填充因子为 0.62。此外,掺入钼的光阳极还具有很高的稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

摘要图片

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
n-Si/SiOx/CoOx-Mo Photoanode for Efficient Photoelectrochemical Water Oxidation (Small 3/2024)

Photoelectrochemical Water Oxidation

In article number 2304376, Kin Ho Lo, Hui Pan, and co-workers report a metal-insulator-semiconductor (MIS) structure photoanode (n-Si/SiOx/CoOx-Mo) to show a high photovoltage of 650 mV, saturation current density of 27.6 mA cm−2, and fill factor of 0.62 in 1.0 M K3BO3 because the energy barrier, charge transfer, reaction kinetics, and active sites are dramatically increased by the Mo-incorporation. And the Mo-incorporated photoanode is also highly stable.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Small
Small 工程技术-材料科学:综合
CiteScore
17.70
自引率
3.80%
发文量
1830
审稿时长
2.1 months
期刊介绍: Small serves as an exceptional platform for both experimental and theoretical studies in fundamental and applied interdisciplinary research at the nano- and microscale. The journal offers a compelling mix of peer-reviewed Research Articles, Reviews, Perspectives, and Comments. With a remarkable 2022 Journal Impact Factor of 13.3 (Journal Citation Reports from Clarivate Analytics, 2023), Small remains among the top multidisciplinary journals, covering a wide range of topics at the interface of materials science, chemistry, physics, engineering, medicine, and biology. Small's readership includes biochemists, biologists, biomedical scientists, chemists, engineers, information technologists, materials scientists, physicists, and theoreticians alike.
期刊最新文献
A Review of Advances in Heterostructured Catalysts for Li-S Batteries: Structural Design and Mechanism Analysis. Bio-Inspired Core-Shell Structured Electrode Particles with Protective Mechanisms for Lithium-Ion Batteries. Combination Nanodrug Delivery Systems Facilitate the Syncretism of Chemotherapy with Immunotherapy to Promote Cancer Treatment. Double-Layered Microneedle Patch Integrated with Multifunctional Nanoparticles and Live Bacteria for Long-Term Treatment of Atopic Dermatitis. Engineering Photocarrier Redistributions in Graphene/III-V Quantum Dot Mixed-Dimensional Heterostructures for Radiative Recombination Enhancements.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1