在铌酸锂薄膜上制作片上阵列波导光栅

IF 3.7 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Advanced Photonics Research Pub Date : 2024-02-02 DOI:10.1002/adpr.202470005
Zhe Wang, Zhiwei Fang, Zhaoxiang Liu, Youting Liang, Jian Liu, Jianping Yu, Ting Huang, Yuan Zhou, Haisu Zhang, Min Wang, Ya Cheng
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引用次数: 0

摘要

方志伟、王敏、程亚及其合作者采用光刻辅助化学机械刻蚀技术,制作出了片上 8 通道铌酸锂薄膜阵列波导光栅(AWG)(见文章编号 2300228)。片上损耗低至 3.32 dB,单通道带宽为 1.6 nm,总通道带宽为 12.8 nm。相邻通道之间的串扰测量值低于 -3.83 dB,非相邻通道之间的串扰测量值低于 -15 dB。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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On-Chip Arrayed Waveguide Grating Fabricated on Thin-Film Lithium Niobate

Zhiwei Fang, Min Wang, Ya Cheng and co-workers have fabricated an on-chip 8-channel thin-film lithium-niobate arrayed waveguide grating (AWG) by using photolithography-assisted chemo-mechanical etching technique (see article number 2300228). On-chip loss as low as 3.32 dB, a single-channel bandwidth of 1.6 nm, and a total-channel bandwidth of 12.8 nm are obtained. The cross talk between adjacent channels is measured to be below –3.83 dB and the cross talk between nonadjacent channels is below –15 dB.

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