差分相衬 (DPC) 映射电场:优化实验条件。

IF 1.5 4区 工程技术 Q3 MICROSCOPY Journal of microscopy Pub Date : 2024-02-14 DOI:10.1111/jmi.13271
Chen Li, Xiaoke Mu, Maxim Korytov, Ioannis Alexandrou, Eric G. T. Bosch
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引用次数: 0

摘要

扫描透射电子显微镜(STEM)中的 DPC 是绘制半导体材料电场图的重要方法。然而,优化实验条件是一项挑战。在本文中,我们使用四象限分段探测器和含有不同砷浓度层的硅试样,测试并比较了关键实验参数,包括会聚角、相机长度、加速电压、样品配置和方向。DPC 测量结果显示与估计电场大致呈线性相关,直到电场接近检测极限为止,在样品厚度为 145 nm 时,检测极限为 0.5 mV/nm。这些结果可以帮助我们了解在不同的用户情况下应使用哪种技术:当平面交界处的电场高于 ∼0.5 mV/nm 时,使用分段检测器的 DPC 可用于电场绘图。对于平面结,可以通过增加试样厚度来提高 DPC 信噪比。然而,对于电场小于 ∼0.5 mV/nm 的半导体器件或含有弯曲结的器件,DPC 并不可靠,因此需要探索灵敏度更高的技术,例如使用像素化检测器的 4D STEM。
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Differential phase contrast (DPC) mapping electric fields: Optimising experimental conditions

DPC in Scanning Transmission Electron Microscopy (STEM) is a valuable method for mapping the electric fields in semiconductor materials. However, optimising the experimental conditions can be challenging. In this paper, we test and compare critical experimental parameters, including the convergence angle, camera length, acceleration voltage, sample configuration, and orientation using a four-quadrant segmented detector and a Si specimen containing layers of different As concentrations. The DPC measurements show a roughly linear correlation with the estimated electric fields, until the field gets close to the detection limitation, which is ∼0.5 mV/nm with a sample thickness of ∼145 nm. These results can help inform which technique to use for different user cases: When the electric field at a planar junction is above ∼0.5 mV/nm, DPC with a segmented detector is practical for electric field mapping. With a planar junction, the DPC signal-to-noise ratio can be increased by increasing the specimen thickness. However, for semiconductor devices with electric fields smaller than ∼0.5 mV/nm, or for devices containing curved junctions, DPC is unreliable and techniques with higher sensitivity will need to be explored, such as 4D STEM using a pixelated detector.

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来源期刊
Journal of microscopy
Journal of microscopy 工程技术-显微镜技术
CiteScore
4.30
自引率
5.00%
发文量
83
审稿时长
1 months
期刊介绍: The Journal of Microscopy is the oldest journal dedicated to the science of microscopy and the only peer-reviewed publication of the Royal Microscopical Society. It publishes papers that report on the very latest developments in microscopy such as advances in microscopy techniques or novel areas of application. The Journal does not seek to publish routine applications of microscopy or specimen preparation even though the submission may otherwise have a high scientific merit. The scope covers research in the physical and biological sciences and covers imaging methods using light, electrons, X-rays and other radiations as well as atomic force and near field techniques. Interdisciplinary research is welcome. Papers pertaining to microscopy are also welcomed on optical theory, spectroscopy, novel specimen preparation and manipulation methods and image recording, processing and analysis including dynamic analysis of living specimens. Publication types include full papers, hot topic fast tracked communications and review articles. Authors considering submitting a review article should contact the editorial office first.
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