研究表面处理对涂层机械性能的影响

Q3 Engineering Pollack Periodica Pub Date : 2024-02-12 DOI:10.1556/606.2024.00955
Salman Khayoon Aldriasawi, Abbas Nasser Hasein, Ashham Muhammed Anead, Barhm Mohamad
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引用次数: 0

摘要

研究分析了表面处理对铁基非晶涂层机械性能的影响。试样在 670 和 770 °C 的真空加热条件下经过了六小时的处理。结果显示涂层具有明显的机械特征:维氏硬度达到 755,扫描电子显微镜图像显示出玻璃相,显示出良好的耐磨性和-55 兆帕左右的压缩残余应力。通过联合真空热处理和喷砂,压缩残余应力明显增加了 122%。在 670 °C 下进行处理并喷砂后,体积磨损从最初的 18 mm3 减少到 14 mm3,表明耐磨性提高了 30%。然而,在 770 °C 下进行真空热处理会对涂层性能产生负面影响。
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Investigation the effect of surface treatment on the mechanical properties of coating
The study analyzed surface treatment's impact on mechanical properties of Fe-based amorphous coatings. Specimens underwent six-hour treatments at 670 and 770 °C using vacuum heat. Results revealed distinct mechanical features in the coating: Vickers hardness reached 755, scanning electron microscope images displayed glassy phases, showcasing good wear resistance and compressive residual stresses at around −55 MPa. A remarkable 122% increase in compressive residual stress was noted through combined vacuum heat treatment and sandblasting. Volume wear decreased from the initial 18 to 14 mm3 after treatment at 670 °C followed by sandblasting, indicating a 30% enhancement in wear resistance. Yet, using vacuum heat treatment at 770 °C negatively impacted the coating's properties.
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来源期刊
Pollack Periodica
Pollack Periodica Engineering-Civil and Structural Engineering
CiteScore
1.50
自引率
0.00%
发文量
82
期刊介绍: Pollack Periodica is an interdisciplinary, peer-reviewed journal that provides an international forum for the presentation, discussion and dissemination of the latest advances and developments in engineering and informatics. Pollack Periodica invites papers reporting new research and applications from a wide range of discipline, including civil, mechanical, electrical, environmental, earthquake, material and information engineering. The journal aims at reaching a wider audience, not only researchers, but also those likely to be most affected by research results, for example designers, fabricators, specialists, developers, computer scientists managers in academic, governmental and industrial communities.
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