改善新型 AlGaN/GaN HEMT 的单次瞬态效应,提高击穿电压

IF 6.7 3区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Journal of Science: Advanced Materials and Devices Pub Date : 2024-02-19 DOI:10.1016/j.jsamd.2024.100692
Shuxiang Sun , Xintong Xie , Pengfei Zhang , Zhijia Zhao , Jie Wei , Xiaorong Luo
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引用次数: 0

摘要

为了改善单事件瞬态(SET)效应和击穿特性,我们提出了一种新型 AlGaN/GaN HEMT。该器件具有一个 AlGaN 背势垒层和一个埋在背势垒层中的 P-GaN 岛(BP-HEMT)。首先,P-GaN 岛不仅能调节电场分布,减少阻塞状态和离子撞击后的撞击电离,还能提高空穴-电子重组率。因此,它不仅能有效提高击穿电压(),还能降低离子撞击后的电流峰值,从而改善抗 SET 性能。其次,AlGaN 背障将电子限制在沟道中,因此,一方面有利于实现高饱和漏极电流()和低导通电阻();另一方面,在阻塞状态和离子撞击后,它都能有效防止离子撞击引入的缓冲层中的电子到达漏极。TCAD 仿真结果表明,BP-HEMT 的 SET 峰值漏极电流从传统 HEMT 的 4.17 A/mm 显著降至 0.49 A/mm,线性能量传递(LET)为 0.6 pC/μm,电压从 175.2 V 显著升高至 1318.3 V,并降低了 11.1%。
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Improvement of single event transients effect for a novel AlGaN/GaN HEMT with enhanced breakdown voltage

A novel AlGaN/GaN HEMT is proposed to improve its single event transient (SET) effect and breakdown characteristics. The device features an AlGaN back barrier layer and a buried P-GaN island in the back barrier layer (BP-HEMT). First, the P-GaN island not only modulates the electric field distribution and reduces impact ionization at both the blocking state and after ion strike but also increases the hole-electron recombination rate. Therefore, it not only effectively increases the breakdown voltage (BV), but also improves the anti-SET performance owing to decreasing the current peak after ion strike. Second, the AlGaN back barrier confines electrons in the channel, and thus, on one hand, it is beneficial to the high saturation drain current (Id,sat) and low on-state resistance (Ron); on the other hand, it effectively prevents the electrons in the buffer layer introduced by ion strike from reaching the drain electrode both at the blocking state and after ion strike. The TCAD simulation results show that the SET peak drain current of the BP-HEMT is significantly dropped to 0.49 A/mm from 4.17 A/mm of the conventional HEMT with a linear energy transfer (LET) of 0.6 pC/μm, and the BV is significantly increased to 1318.3 V from 175.2 V, as well as the Ron decreases by 11.1%.

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来源期刊
Journal of Science: Advanced Materials and Devices
Journal of Science: Advanced Materials and Devices Materials Science-Electronic, Optical and Magnetic Materials
CiteScore
11.90
自引率
2.50%
发文量
88
审稿时长
47 days
期刊介绍: In 1985, the Journal of Science was founded as a platform for publishing national and international research papers across various disciplines, including natural sciences, technology, social sciences, and humanities. Over the years, the journal has experienced remarkable growth in terms of quality, size, and scope. Today, it encompasses a diverse range of publications dedicated to academic research. Considering the rapid expansion of materials science, we are pleased to introduce the Journal of Science: Advanced Materials and Devices. This new addition to our journal series offers researchers an exciting opportunity to publish their work on all aspects of materials science and technology within the esteemed Journal of Science. With this development, we aim to revolutionize the way research in materials science is expressed and organized, further strengthening our commitment to promoting outstanding research across various scientific and technological fields.
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