通过调整物理参数优化基于互补碳纳米管场效应晶体管的纳米级运算放大器

IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Nanotechnology Pub Date : 2024-02-27 DOI:10.1109/TNANO.2024.3370098
Hao Ding;Lan Chen;Wentao Huang
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引用次数: 0

摘要

碳纳米管场效应晶体管(CNFET)具有高电流密度和载流子迁移率,可在 20 纳米技术节点以下实现高固有增益。因此,与传统的硅模拟集成电路(IC)相比,它们表现出更优越的性能。本文分析和模拟了模拟集成电路设计中 CNFET 的相关参数,阐明了物理参数对 CNFET 器件的影响。所有模拟均在小于 22 纳米的技术节点上进行。为了评估 CNFET 模拟电路的性能,采用了 CNFET 的 gm/Id 方法,并利用沟道长度为 14 纳米的互补 CNFET 技术设计了一个纳米级两级运算放大器。此外,还研究了 CNFET 物理参数对电路性能的影响。研究结果表明了 CNFET 模拟电路相对于传统硅基模拟电路的优势,以及 CNFET 物理参数对电路性能的重要影响。因此,这项研究为生产 CNFET 技术提供了参考。
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Optimization of a Nanoscale Operational Amplifier Based on a Complementary Carbon Nanotube Field-Effect Transistor by Adjusting Physical Parameters
Carbon nanotube field-effect transistors (CNFETs) possess high current density and carrier mobility, enabling high intrinsic gains below the 20-nm technology node. Thus, they demonstrate superior performance compared to traditional silicon analog integrated circuits (ICs). Here, the relevant parameters of a CNFET in analog IC designs were analyzed and simulated, elucidating the influence of physical parameters on the CNFET device. All simulations were performed at technology nodes smaller than 22 nm. To evaluate the performance of a CNFET analog circuit, the g m /I d method for CNFET was employed, and a nanoscale two-stage operational amplifier was designed using complementary CNFET technology with a channel length of 14 nm. In addition, the impact of CNFET's physical parameters on circuit performance were examined. Our results showcased the advantages of CNFET analog circuits over traditional silicon-based analog circuits, as well as the significant influence of CNFET physical parameters on circuit performance. Consequently, this study provides a reference for productive CNFET technologies.
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来源期刊
IEEE Transactions on Nanotechnology
IEEE Transactions on Nanotechnology 工程技术-材料科学:综合
CiteScore
4.80
自引率
8.30%
发文量
74
审稿时长
8.3 months
期刊介绍: The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.
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