碲化镉晶体等直径种子生长的进展:液相外延中的数值建模方法和应用

IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Journal of Crystal Growth Pub Date : 2024-03-13 DOI:10.1016/j.jcrysgro.2024.127670
Chao Xu, Juan Zhang, Changhe Zhou, Shangshu Li, Ruiyun Sun
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引用次数: 0

摘要

碲锌镉(CZT)是碲镉汞(MCT)红外探测器和室温核辐射探测器的首选材料。然而,由于其固有的热物理性质,如极低的热导率和堆叠断层能,使得大体积晶体的生长变得复杂,从而导致成品率较低,阻碍了它们的广泛应用。本文基于稳态计算机数值模型模拟,研究了晶体生长过程中种子尺寸变化(从 15 毫米到 90 毫米)对初始生长表面形态的影响,模拟结果表明,较大的种子晶体容易形成更多的凸界面,有利于增强晶体生长。我们开发了一种优化的垂直梯度冻结(VGF)方法,采用直径约为 90 毫米的种子(与生长的晶体直径相同),在 VGF 炉中生长出缺陷密度较低的单晶体,并讨论了该方法在液相外延(LPE)中的应用。
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Advancements in Iso-Diameter seeded growth of CdZnTe crystals: A numerical modeling approach and applications in liquid phase Epitaxy

CdZnTe (CZT) is the preferred material for HgCdTe (MCT) infrared detectors and room temperature nuclear-radiation detector applications. However, their widespread application is hindered by the low yield, attributed to intrinsic thermophysical properties like extremely low thermal conductivity and stacking fault energy, complicating the growth of large-volume crystals. Based on steady-state computer numerical modeling simulation, this paper examines the impact of seed size variations (from 15 mm to 90 mm) in the crystal growth process on the initial growth surface morphology, simulations indicate that larger seed crystals are predisposed to developing more convex interfaces, which are conducive to enhanced crystal growth. An optimized Vertical Gradient Freeze (VGF) method employing iso-diameter seed (having the same diameter as the grown crystals) of approximately 90 mm has been developed to grow single crystals with reduced defect density in a VGF furnace, and the applications in liquid phase epitaxy (LPE) are also discussed.

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来源期刊
Journal of Crystal Growth
Journal of Crystal Growth 化学-晶体学
CiteScore
3.60
自引率
11.10%
发文量
373
审稿时长
65 days
期刊介绍: The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.
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