卤素前驱体对 InSb 纳米结构生长的影响

IF 1.9 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Semiconductor Science and Technology Pub Date : 2024-03-12 DOI:10.1088/1361-6641/ad2bac
Alexander K Sten, Kevin M Roccapriore, Brian Squires, Chris Littler, A J Syllaios, Usha Philipose
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引用次数: 0

摘要

本研究强调了卤素化合物在改变 InSb 纳米结构形状方面的作用,同时保持了纳米结构的高结晶质量。我们通过常压化学气相沉积合成了一维(1D)纳米线(NWs)和二维(2D)纳米板(NPLs)。我们的实验结果表明,在临界生长温度为 512 ∘C 时,当使用金(Au)纳米粒子在 InSb 薄膜上引发生长时,InSb NW 会通过传统的气-液-固生长机制生长。研究发现,生成的 NWs 具有圆柱形或锥形的形状,结晶质量高,并且具有化学计量成分。在卤素前驱体存在的情况下,观察到形态发生了变化,生成的纳米结构为二维 NPL 和刻面 NW。利用现有的晶体生长模型以及体积能、表面能和边缘能的概念,实验结果可以解释为氯原子吸附在纳米晶体的宽面或窄面上,引发成核并促进 NPL 或刻面 NW 的形成。氯原子的加入为 CVD 合成纳米结构增添了新的自由度,其结果有望用于纳米电子器件的新型一维和二维纳米结构的可控生长。
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Influence of halogen precursors on the growth of InSb nanostructures
The present work highlights the role of halogen compounds in modifying the shape of the InSb nanostructures, while maintaining a high crystalline quality of the nanostructures. One-dimensional (1D) nanowires (NWs) and two-dimensional (2D) nanoplatelets (NPLs) were synthesized by ambient pressure chemical vapor deposition. Our experimental results suggest that at a critical growth temperature of 512 C, InSb NWs grow by the traditional vapor–liquid–solid growth mechanism when gold (Au) nanoparticles are used to initiate growth on an InSb film. The resulting NWs were found to have a cylindrical or tapered shape, were of high crystalline quality, and had stoichiometric composition. In the presence of halogen precursors, a change in morphology was observed and the resulting nanostructures were 2D NPLs and faceted NWs. Using existing models of crystal growth and concepts of volume, surface and edge energies, the experimental results are explained on the basis of chlorine atoms adsorbed on the wide or narrow facets of a nanocrystal, initiating nucleation and facilitating NPL or faceted NW formation. The incorporation of the chlorine atoms add a new degree of freedom to CVD synthesis of nanostructures and the results are promising for the controlled growth of novel 1D and 2D nanostructures for nano-electronic devices.
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来源期刊
Semiconductor Science and Technology
Semiconductor Science and Technology 工程技术-材料科学:综合
CiteScore
4.30
自引率
5.30%
发文量
216
审稿时长
2.4 months
期刊介绍: Devoted to semiconductor research, Semiconductor Science and Technology''s multidisciplinary approach reflects the far-reaching nature of this topic. The scope of the journal covers fundamental and applied experimental and theoretical studies of the properties of non-organic, organic and oxide semiconductors, their interfaces and devices, including: fundamental properties materials and nanostructures devices and applications fabrication and processing new analytical techniques simulation emerging fields: materials and devices for quantum technologies hybrid structures and devices 2D and topological materials metamaterials semiconductors for energy flexible electronics.
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