{"title":"磁滞曲线对铁电场效应晶体管阈下波动的影响","authors":"Hakkee Jung","doi":"10.15625/2525-2518/18627","DOIUrl":null,"url":null,"abstract":"The changes in Subthreshold Swing (SS) were observed for changes in remanent polarization Pr and coercive field Ec, which determine the characteristics of the P-E hysteresis curve of ferroelectric in Ferrolectric FET (FeFET). A multilayer structure of Metal-Ferroelectric-Metal-Insulator-Semiconductor (MFMIS) was used for the junctionless double gate structure. To obtain the SS value, the analytical SS model was used. The ranges of 15≤Pr ≤30 μC/cm2 and 0.8≤Ec≤1.5 MV/cm, which were reasonable in various experiments and did not generate unstable regions in the relationship of drain current and gate voltage, were considered. As a result, the SS decreased as Pr decreased and Ec increased due to the capacitance change in the ferroelectric. This phenomenon is because the controllability of channel carriers by the gate voltage increases due to the increasing of change in the ferroelectric voltage for the gate voltage as Pr decreases and the memory window increases. Since the SS decreased linearly in the memory window, the SS constantly changed according to the ratio of Pr and Ec, Pr/Ec. As the ferroelectric thickness increased, the SS decreased significantly, but the change of SS with respect to the Pr/Ec was severe. In general, as the channel length decreases, SS increases. However, when the Pr/Ec decreased to 10 pF/cm, the SS tended to decrease as the channel length decreased. The reason for this can be attributed to the fact that the relative thickness of ferroelectric increases with small channel length.","PeriodicalId":23553,"journal":{"name":"Vietnam Journal of Science and Technology","volume":"51 8","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-02-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Impact of Hysteresis Curve on Subthreshold Swing in Ferroelectric FET\",\"authors\":\"Hakkee Jung\",\"doi\":\"10.15625/2525-2518/18627\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The changes in Subthreshold Swing (SS) were observed for changes in remanent polarization Pr and coercive field Ec, which determine the characteristics of the P-E hysteresis curve of ferroelectric in Ferrolectric FET (FeFET). A multilayer structure of Metal-Ferroelectric-Metal-Insulator-Semiconductor (MFMIS) was used for the junctionless double gate structure. To obtain the SS value, the analytical SS model was used. The ranges of 15≤Pr ≤30 μC/cm2 and 0.8≤Ec≤1.5 MV/cm, which were reasonable in various experiments and did not generate unstable regions in the relationship of drain current and gate voltage, were considered. As a result, the SS decreased as Pr decreased and Ec increased due to the capacitance change in the ferroelectric. This phenomenon is because the controllability of channel carriers by the gate voltage increases due to the increasing of change in the ferroelectric voltage for the gate voltage as Pr decreases and the memory window increases. Since the SS decreased linearly in the memory window, the SS constantly changed according to the ratio of Pr and Ec, Pr/Ec. As the ferroelectric thickness increased, the SS decreased significantly, but the change of SS with respect to the Pr/Ec was severe. In general, as the channel length decreases, SS increases. However, when the Pr/Ec decreased to 10 pF/cm, the SS tended to decrease as the channel length decreased. The reason for this can be attributed to the fact that the relative thickness of ferroelectric increases with small channel length.\",\"PeriodicalId\":23553,\"journal\":{\"name\":\"Vietnam Journal of Science and Technology\",\"volume\":\"51 8\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-02-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Vietnam Journal of Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.15625/2525-2518/18627\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vietnam Journal of Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.15625/2525-2518/18627","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
在铁电场效应晶体管(FeFET)中,阈下摆动(SS)随剩极化 Pr 和矫顽力场 Ec 的变化而变化,而剩极化和矫顽力场 Ec 决定了铁电的 P-E 磁滞曲线特性。无结双栅结构采用了金属-铁电-金属-绝缘体-半导体(MFMIS)的多层结构。为了获得 SS 值,使用了 SS 分析模型。考虑了 15≤Pr ≤30 μC/cm2 和 0.8≤Ec≤1.5 MV/cm 的范围,这些范围在各种实验中都是合理的,并且在漏极电流和栅极电压的关系中不会产生不稳定区域。结果,由于铁电体中电容的变化,SS 随着 Pr 的减小和 Ec 的增大而减小。出现这种现象的原因是,随着 Pr 减小和存储器窗口增大,铁电电压对栅极电压的变化增大,沟道载流子对栅极电压的可控性也随之增大。由于 SS 在存储器窗口中呈线性下降,因此 SS 会根据 Pr 和 Ec 的比值(Pr/Ec)不断变化。随着铁电厚度的增加,SS 显著减小,但 SS 随 Pr/Ec 的变化非常剧烈。一般来说,随着沟道长度的减少,SS 会增加。然而,当 Pr/Ec 下降到 10 pF/cm 时,随着沟道长度的减少,SS 也呈下降趋势。其原因可能是铁电体的相对厚度随着通道长度的减小而增加。
Impact of Hysteresis Curve on Subthreshold Swing in Ferroelectric FET
The changes in Subthreshold Swing (SS) were observed for changes in remanent polarization Pr and coercive field Ec, which determine the characteristics of the P-E hysteresis curve of ferroelectric in Ferrolectric FET (FeFET). A multilayer structure of Metal-Ferroelectric-Metal-Insulator-Semiconductor (MFMIS) was used for the junctionless double gate structure. To obtain the SS value, the analytical SS model was used. The ranges of 15≤Pr ≤30 μC/cm2 and 0.8≤Ec≤1.5 MV/cm, which were reasonable in various experiments and did not generate unstable regions in the relationship of drain current and gate voltage, were considered. As a result, the SS decreased as Pr decreased and Ec increased due to the capacitance change in the ferroelectric. This phenomenon is because the controllability of channel carriers by the gate voltage increases due to the increasing of change in the ferroelectric voltage for the gate voltage as Pr decreases and the memory window increases. Since the SS decreased linearly in the memory window, the SS constantly changed according to the ratio of Pr and Ec, Pr/Ec. As the ferroelectric thickness increased, the SS decreased significantly, but the change of SS with respect to the Pr/Ec was severe. In general, as the channel length decreases, SS increases. However, when the Pr/Ec decreased to 10 pF/cm, the SS tended to decrease as the channel length decreased. The reason for this can be attributed to the fact that the relative thickness of ferroelectric increases with small channel length.