磁滞曲线对铁电场效应晶体管阈下波动的影响

Hakkee Jung
{"title":"磁滞曲线对铁电场效应晶体管阈下波动的影响","authors":"Hakkee Jung","doi":"10.15625/2525-2518/18627","DOIUrl":null,"url":null,"abstract":"The changes in Subthreshold Swing (SS) were observed for changes in remanent polarization Pr and coercive field Ec, which determine the characteristics of the P-E hysteresis curve of ferroelectric in Ferrolectric FET (FeFET). A multilayer structure of Metal-Ferroelectric-Metal-Insulator-Semiconductor (MFMIS) was used for the junctionless double gate structure. To obtain the SS value, the analytical SS model was used. The ranges of 15≤Pr ≤30 μC/cm2 and 0.8≤Ec≤1.5 MV/cm, which were reasonable in various experiments and did not generate unstable regions in the relationship of drain current and gate voltage, were considered. As a result, the SS decreased as Pr decreased and Ec increased due to the capacitance change in the ferroelectric. This phenomenon is because the controllability of channel carriers by the gate voltage increases due to the increasing of change in the ferroelectric voltage for the gate voltage as Pr decreases and the memory window increases. Since the SS decreased linearly in the memory window, the SS constantly changed according to the ratio of Pr and Ec, Pr/Ec. As the ferroelectric thickness increased, the SS decreased significantly, but the change of SS with respect to the Pr/Ec was severe. In general, as the channel length decreases, SS increases. However, when the Pr/Ec decreased to 10 pF/cm, the SS tended to decrease as the channel length decreased. The reason for this can be attributed to the fact that the relative thickness of ferroelectric increases with small channel length.","PeriodicalId":23553,"journal":{"name":"Vietnam Journal of Science and Technology","volume":"51 8","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-02-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Impact of Hysteresis Curve on Subthreshold Swing in Ferroelectric FET\",\"authors\":\"Hakkee Jung\",\"doi\":\"10.15625/2525-2518/18627\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The changes in Subthreshold Swing (SS) were observed for changes in remanent polarization Pr and coercive field Ec, which determine the characteristics of the P-E hysteresis curve of ferroelectric in Ferrolectric FET (FeFET). A multilayer structure of Metal-Ferroelectric-Metal-Insulator-Semiconductor (MFMIS) was used for the junctionless double gate structure. To obtain the SS value, the analytical SS model was used. The ranges of 15≤Pr ≤30 μC/cm2 and 0.8≤Ec≤1.5 MV/cm, which were reasonable in various experiments and did not generate unstable regions in the relationship of drain current and gate voltage, were considered. As a result, the SS decreased as Pr decreased and Ec increased due to the capacitance change in the ferroelectric. This phenomenon is because the controllability of channel carriers by the gate voltage increases due to the increasing of change in the ferroelectric voltage for the gate voltage as Pr decreases and the memory window increases. Since the SS decreased linearly in the memory window, the SS constantly changed according to the ratio of Pr and Ec, Pr/Ec. As the ferroelectric thickness increased, the SS decreased significantly, but the change of SS with respect to the Pr/Ec was severe. In general, as the channel length decreases, SS increases. However, when the Pr/Ec decreased to 10 pF/cm, the SS tended to decrease as the channel length decreased. The reason for this can be attributed to the fact that the relative thickness of ferroelectric increases with small channel length.\",\"PeriodicalId\":23553,\"journal\":{\"name\":\"Vietnam Journal of Science and Technology\",\"volume\":\"51 8\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-02-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Vietnam Journal of Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.15625/2525-2518/18627\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vietnam Journal of Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.15625/2525-2518/18627","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

在铁电场效应晶体管(FeFET)中,阈下摆动(SS)随剩极化 Pr 和矫顽力场 Ec 的变化而变化,而剩极化和矫顽力场 Ec 决定了铁电的 P-E 磁滞曲线特性。无结双栅结构采用了金属-铁电-金属-绝缘体-半导体(MFMIS)的多层结构。为了获得 SS 值,使用了 SS 分析模型。考虑了 15≤Pr ≤30 μC/cm2 和 0.8≤Ec≤1.5 MV/cm 的范围,这些范围在各种实验中都是合理的,并且在漏极电流和栅极电压的关系中不会产生不稳定区域。结果,由于铁电体中电容的变化,SS 随着 Pr 的减小和 Ec 的增大而减小。出现这种现象的原因是,随着 Pr 减小和存储器窗口增大,铁电电压对栅极电压的变化增大,沟道载流子对栅极电压的可控性也随之增大。由于 SS 在存储器窗口中呈线性下降,因此 SS 会根据 Pr 和 Ec 的比值(Pr/Ec)不断变化。随着铁电厚度的增加,SS 显著减小,但 SS 随 Pr/Ec 的变化非常剧烈。一般来说,随着沟道长度的减少,SS 会增加。然而,当 Pr/Ec 下降到 10 pF/cm 时,随着沟道长度的减少,SS 也呈下降趋势。其原因可能是铁电体的相对厚度随着通道长度的减小而增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Impact of Hysteresis Curve on Subthreshold Swing in Ferroelectric FET
The changes in Subthreshold Swing (SS) were observed for changes in remanent polarization Pr and coercive field Ec, which determine the characteristics of the P-E hysteresis curve of ferroelectric in Ferrolectric FET (FeFET). A multilayer structure of Metal-Ferroelectric-Metal-Insulator-Semiconductor (MFMIS) was used for the junctionless double gate structure. To obtain the SS value, the analytical SS model was used. The ranges of 15≤Pr ≤30 μC/cm2 and 0.8≤Ec≤1.5 MV/cm, which were reasonable in various experiments and did not generate unstable regions in the relationship of drain current and gate voltage, were considered. As a result, the SS decreased as Pr decreased and Ec increased due to the capacitance change in the ferroelectric. This phenomenon is because the controllability of channel carriers by the gate voltage increases due to the increasing of change in the ferroelectric voltage for the gate voltage as Pr decreases and the memory window increases. Since the SS decreased linearly in the memory window, the SS constantly changed according to the ratio of Pr and Ec, Pr/Ec. As the ferroelectric thickness increased, the SS decreased significantly, but the change of SS with respect to the Pr/Ec was severe. In general, as the channel length decreases, SS increases. However, when the Pr/Ec decreased to 10 pF/cm, the SS tended to decrease as the channel length decreased. The reason for this can be attributed to the fact that the relative thickness of ferroelectric increases with small channel length.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
CiteScore
0.50
自引率
0.00%
发文量
0
期刊最新文献
comprehensive review of rock dust for soil remineralization in sustainable agriculture and preliminary assessment of nutrient values in micronized porous basalt rock from Nghe-An province, Vietnam Effect of rice husk morphology on the ability to synthesize silicon carbide by pyrolysis method Manufacturing of Al-Zr-Si master alloy from zircon concentrate Synthesis of Polybenzoxazine as an environmentally friendly adhesive material from cardanol and post-consumer PET source Study on solidified material from dredged sediment, fly ash, and blended Portland cement using the response surface method
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1