半导体中的掺杂效应和能带隙之间的关系、电离系数和光吸收系数的影响

Md. Bappi Pramanik, Md. Abdullah Al Rakib, Md. Abubakor Siddik, Shorab Bhuiyan
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引用次数: 0

摘要

掺杂工艺在广泛应用于电子设备生产的半导体技术中非常重要。掺杂对半导体的电阻率、迁移率和能带隙的影响很大,会极大地影响电子设备的性能。本论文旨在研究掺杂对半导体的电阻率、迁移率、能带间隙、电离系数和光吸收系数的影响。研究涉及深入分析掺杂半导体的电子特性及其在各种条件下的行为。本论文将全面了解掺杂对半导体电子特性的影响。本论文观察了能带间隙、电离系数的影响以及光吸收系数。在实验结果中,发现了能带间隙与原子密度、光吸收系数与原子密度、影响电离与原子密度、影响电离系数与光吸收系数、电阻率和迁移率之间的关系。
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Doping Effects and Relationship between Energy Band Gaps, Impact of Ionization Coefficient and Light Absorption Coefficient in Semiconductors
The doping process is very important in semiconductor technology that is widely used in the production of electronic devices. The effects of doping on the resistivity, mobility and energy band gap of semiconductors are significant and can greatly impact the performance of electronic devices. This thesis aims to investigate the impact of doping on the resistivity, mobility, energy band gap, impact of ionization coefficient, and light absorption coefficient of semiconductors. The study involves an in-depth analysis of the electronic properties of doped semiconductors and their behavior in various conditions. This thesis will provide a comprehensive understanding of the impact of doping on the electronic properties of semiconductors. The energy band gap, impact of ionization coefficient, and Light absorption coefficient were observed in this thesis. In the experimental result, the relation between energy band gap and atomic density, light absorption coefficient and atomic density, impact ionization and atomic density, impact ionization coefficient and Light absorption coefficient, resistivity and mobility has been found.  
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