基于硅迁移密封和氢扩散的真空密封 MEMS 谐振器

IF 2.5 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Microelectromechanical Systems Pub Date : 2024-04-12 DOI:10.1109/JMEMS.2024.3382768
Tianjiao Gong;Muhammad Jehanzeb Khan;Yukio Suzuki;Takashiro Tsukamoto;Shuji Tanaka
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引用次数: 0

摘要

在本研究中,我们介绍了一种利用硅迁移密封(SMS)技术对 MEMS 谐振器进行真空封装的创新方法,这是一种新型晶圆级真空封装方法。SMS 利用高温(>1000°C)氢气环境下的硅回流现象来有效密封释放孔。我们在标准 SOI 晶圆上制作的 MEMS 谐振器上成功演示了这一技术,这种谐振器常用于惯性传感器和定时装置。封装完成后,在氮气环境下于 430°C 退火 27 小时,氢从密封腔扩散。利用聚焦离子束 (FIB) 穿透共振元件外部进行的进一步分析证实,密封腔内的真空度有了显著提高,估计达到了约 60 Pa。值得注意的是,在 145°C 的温度下进行额外的空气烘烤后,保持较高的 Q 因子表明真空度可能低于 10 Pa。这些发现不仅说明了 SMS 在晶圆级真空封装中的效率,还为优化 MEMS 封装中的密封压力提供了可能性。[2024-0014]
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Vacuum-Sealed MEMS Resonators Based on Silicon Migration Sealing and Hydrogen Diffusion
In this study, we introduce an innovative approach to vacuum-encapsulation of MEMS resonators using Silicon Migration Seal (SMS) technology, a novel wafer-level vacuum packaging method. SMS utilizes silicon reflow phenomena under high-temperature (>1000°C) hydrogen environments to seal release holes effectively. We successfully demonstrated this technique on a MEMS resonator made on a standard SOI wafer, commonly used in inertial sensors and timing devices. After the encapsulation, hydrogen diffusion from the sealed cavity was performed through annealing at 430°C for 27 hours in a nitrogen environment. Further analysis using focused ion beam (FIB) penetration outside the resonating element confirmed an impressive vacuum level improvement in the sealed cavity, estimated at ~60 Pa. Notably, after additional air-baking at 145°C, the maintained high Q factor suggests a potential vacuum level below 10 Pa. These findings not only illustrate the efficiency of SMS in wafer-level vacuum packaging but also open up possibilities for optimizing sealing pressure in MEMS packaging. [2024-0014]
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来源期刊
Journal of Microelectromechanical Systems
Journal of Microelectromechanical Systems 工程技术-工程:电子与电气
CiteScore
6.20
自引率
7.40%
发文量
115
审稿时长
7.5 months
期刊介绍: The topics of interest include, but are not limited to: devices ranging in size from microns to millimeters, IC-compatible fabrication techniques, other fabrication techniques, measurement of micro phenomena, theoretical results, new materials and designs, micro actuators, micro robots, micro batteries, bearings, wear, reliability, electrical interconnections, micro telemanipulation, and standards appropriate to MEMS. Application examples and application oriented devices in fluidics, optics, bio-medical engineering, etc., are also of central interest.
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