P. Viegas, Jorge Silveira, T. C. Dias, O. Guaitella, A. Morillo-Candas, V. Guerra
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引用次数: 0
摘要
通过介观建模以及与重组概率测量结果的比较,研究了派莱克斯(硼硅玻璃)管中氧气直流辉光放电的表面重组。共评估了 106 种实验条件,放电电流在 10 至 40 mA 之间变化,压力值在 0.75 至 10 托之间变化,外壁温度 (Tw) 固定为 -20、5、25 和 50 ºC。该模型包括 O+O 和 O+O2 表面重组反应以及与 Tw 有关的解吸频率。该模型针对所有 106 种研究条件进行了验证,并具有预测能力。对模拟结果的分析突出表明,在 Tw = -20 ºC 和 Tw = 5 ºC 条件下,主要的重组机制涉及物理吸附氧原子(OF)的朗缪尔-欣舍伍德(L-H)重组 OF + OF 和埃利-里达尔(E-R)重组 O2 + OF,而在 Tw = 25 ºC 和 Tw = 50 ºC 条件下,涉及化学吸附氧原子(OS)的 E-R O + OS 和 L-H OF + OS 过程也发挥了相关作用。本文讨论了相关的重组机制和臭氧壁的产生,以及与较高压力条件的相关性。
Surface recombination in Pyrex in oxygen DC glow discharges: mesoscopic modelling and comparison with experiments
Surface recombination in an oxygen DC glow discharge in a Pyrex (borosilicate glass) tube is studied via mesoscopic modelling and comparison with measurements of recombination probability. A total of 106 experimental conditions are assessed, with discharge current varying between 10 and 40 mA, pressure values ranging between 0.75 and 10 Torr, and fixed outer wall temperatures (Tw) of −20, 5, 25 and 50 ºC. The model includes O+O and O+O2 surface recombination reactions and a Tw dependent desorption frequency. The model is validated for all the 106 studied conditions and intends to have predictive capabilities. The analysis of the simulation results highlights that for Tw = −20 ºC and Tw = 5 ºC the dominant recombination mechanisms involve physisorbed oxygen atoms (OF) in Langmuir-Hinshelwood (L-H) recombination OF + OF and in Eley-Rideal (E-R) recombination O2 + OF, while for Tw = 25 ºC and Tw = 50 ºC processes involving chemisorbed oxygen atoms (OS) in E-R O + OS and L-H OF + OS also play a relevant role. A discussion is taken on the relevant recombination mechanisms and on ozone wall production, with relevance for higher pressure regimes.