变形纳米结构对离子束侵蚀铜的影响

N. N. Andrianova, A. M. Borisov, M. A. Ovchinnikov, R. Kh. Khisamov, R. R. Mulyukov
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摘要

摘要 实验研究了在 30 keV 氩离子高通量辐照下,形变纳米结构对铜离子束侵蚀的影响。为了在初始晶粒大小约为 2 μm 的铜样品中形成晶粒大小约为 0.4 μm 的超细晶粒结构,采用了高压扭转变形纳米结构。研究发现,当溅射厚度与晶粒大小相当的层时,铜表面会形成稳态锥形浮雕,其外观不会随着辐照通量的增加而改变。研究表明,铜的晶粒尺寸越小,表面锥形的浓度越大,高度越小。锥体倾角接近 82°,溅射产量为 9.6 阿特/离子,实际上与铜的晶粒尺寸、溅射层厚度和辐照通量无关。使用 SRIM 程序进行的计算表明,如果考虑到锥体壁上原子的再沉积,锥形铜浮雕 Yc 的溅射产率比单个锥体的溅射产率低 3.5 倍,比光滑表面的溅射产率高 1.2 倍,而 9.25 阿特/离子的值接近实验测量值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Effect of Deformation Nanostructuring on the Ion-Beam Erosion of Copper

The effect of deformation nanostructuring on the ion-beam erosion of copper at a high fluence of irradiation with 30 keV argon ions is experimentally studied. To form an ultrafine-grained structure with a grain size of ~0.4 μm in copper samples with an initial grain size of about 2 μm, deformation nanostructuring by high-pressure torsion is used. It is found that when a layer with a thickness comparable to the grain size is sputtered, a steady-state cone-shaped relief is formed on the copper surface, the appearance of which does not change with increasing irradiation fluence. It is shown that the smaller the grain size in copper, the greater the concentration and the smaller the height of the cones on the surface. The cone inclination angles, close to 82°, as well as the sputtering yield of 9.6 at/ion, are practically independent of the grain size of copper, the thickness of the sputtered layer, and the irradiation fluence. Calculations using the SRIM program show that, when taking into account the redeposition of atoms from the walls of the cones, the sputtering yield of a cone-shaped copper relief Yc is 3.5 times less than the sputtering yield of a single cone, 1.2 times greater than the sputtering yield of a smooth surface, and the value of 9.25 at/ion is close to the experimentally measured one.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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