MOCVD 生长的单晶 Al0.85Sc0.15N 中铁电转换的演示和 STEM 分析

Niklas Wolff, Georg Schönweger, Isabel Streicher, Md Redwanul Islam, Nils Braun, Patrik Straňák, Lutz Kirste, Mario Prescher, Andriy Lotnyk, Hermann Kohlstedt, Stefano Leone, Lorenz Kienle, Simon Fichtner
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摘要

通过金属有机化学气相沉积法生长的沃特兹石型 Al1-xScxN 固溶体首次被证实具有铁电性。厚度为 230 nm、x = 0.15 的薄膜在 1.5 kHz 的测量频率下显示出 5.5 MV cm-1 的矫顽力场。X 射线衍射和光谱方法(如飞行时间二次离子质谱法)证实了薄膜的单晶质量和均匀的化学成分。环形亮场扫描透射电子显微镜证明了铁电极化在单元水平上的反转。单晶体的质量进一步使我们能够首次对钨锆型铁电体的大尺度畴模式进行成像,揭示了沿材料 c 轴的主要锥形畴形状。与之前的研究一样,这再次意味着沿着这条晶体学轴线存在着强烈的极化不连续性,适合于电流传输。畴由窄畴壁分隔,推断出畴壁的厚度上限为 3 纳米,但有可能是原子级的尖锐畴壁。作者相信,这些研究成果将推动钨锆铁电体与氮化镓以及一般基于 III-N 的异质结构和器件的整合。
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Demonstration and STEM Analysis of Ferroelectric Switching in MOCVD-Grown Single Crystalline Al0.85Sc0.15N

Wurtzite-type Al1−xScxN solid solutions grown by metal organic chemical vapor deposition are for the first time confirmed to be ferroelectric. The film with 230 nm thickness and x = 0.15 exhibits a coercive field of 5.5 MV cm−1 at a measurement frequency of 1.5 kHz. The single crystal quality and homogeneous chemical composition of the film are confirmed by X-ray diffraction and spectroscopic methods such as time of flight secondary ion mass spectrometry. Annular bright field scanning transmission electron microscopy serves to prove the ferroelectric polarization inversion at the unit cell level. The single crystal quality further allows to image the large-scale domain pattern of a wurtzite-type ferroelectric for the first time, revealing a predominantly cone-like domain shape along the c-axis of the material. As in previous work, this again implies the presence of strong polarization discontinuities along this crystallographic axis, which can be suitable for current transport. The domains are separated by narrow domain walls, for which an upper thickness limit of 3 nm is deduced but which can potentially be atomically sharp. The authors are confident that these results will advance the commencement of the integration of wurtzite-type ferroelectrics to GaN as well as generally III-N-based heterostructures and devices.

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