原子探针断层成像中的原位脉冲氢植入。

IF 2.9 4区 工程技术 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Microscopy and Microanalysis Pub Date : 2025-02-03 DOI:10.1093/mam/ozae040
Jean-Baptiste Maillet, Gerald Da Costa, Benjamin Klaes, Christian Bacchi, Antoine Normand, Charly Vaudaulon, François Vurpillot
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引用次数: 0

摘要

在原子探针层析成像中研究氢气是一个相关的挑战,因为氢气质量小、扩散系数高,而且作为一种残余气体存在于真空室中,给原子探针研究带来了多种复杂情况。文献中提出了不同的解决方案,如原位充注与低温转移相结合,或在单独的真空室中高温充注氢气。然而,由于在充氢和后续分析过程中需要对试样温度进行复杂的控制,这些解决方案往往面临挑战。在本文中,我们提出了一种原子探针原位氢充电的替代方法,该方法源于在场强离子显微镜中开发的一种方法。通过在低压 H2 下对原子探针室中的试样施加负压纳秒脉冲,证明可以在试样表面下 2-20 纳米范围内植入高剂量 H。对原子探针室进行了改装,使其能够在可控气体压力、脉冲重复率和脉冲振幅下直接施加负脉冲。通过电动力学模拟,我们证明了植入能量在 100-1,000 eV 范围内,并预测了理论植入深度并与实验进行了比较。
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In Situ Pulsed Hydrogen Implantation in Atom Probe Tomography.

The investigation of hydrogen in atom probe tomography appears as a relevant challenge due to its low mass, high diffusion coefficient, and presence as a residual gas in vacuum chambers, resulting in multiple complications for atom probe studies. Different solutions were proposed in the literature like ex situ charging coupled with cryotransfer or H charging at high temperature in a separate chamber. Nevertheless, these solutions often faced challenges due to the complex control of specimen temperature during hydrogen charging and subsequent analysis. In this paper, we propose an alternative route for in situ H charging in atom probe derived from a method developed in field ion microscopy. By applying negative voltage nanosecond pulse on the specimen in an atom probe chamber under a low pressure of H2, it is demonstrated that a high dose of H can be implanted in the range 2-20 nm beneath the specimen surface. An atom probe chamber was modified to enable direct negative pulse application with controlled gas pressure, pulse repetition rate, and pulse amplitude. Through electrodynamical simulations, we show that the implantation energy falls within the range 100-1,000 eV and a theoretical depth of implantation was predicted and compared to experiments.

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来源期刊
Microscopy and Microanalysis
Microscopy and Microanalysis 工程技术-材料科学:综合
CiteScore
1.10
自引率
10.70%
发文量
1391
审稿时长
6 months
期刊介绍: Microscopy and Microanalysis publishes original research papers in the fields of microscopy, imaging, and compositional analysis. This distinguished international forum is intended for microscopists in both biology and materials science. The journal provides significant articles that describe new and existing techniques and instrumentation, as well as the applications of these to the imaging and analysis of microstructure. Microscopy and Microanalysis also includes review articles, letters to the editor, and book reviews.
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