(铁电非挥发性电容式突触用于电荷域内存计算(特邀

Omkar Phadke, Tae-Hyeon Kim, Yuan-Chun Luo, Shimeng Yu
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摘要

铁电场效应晶体管(FeFET)可配置为 nvCAP 模式,以实现小信号电容读出。在 nvCAP 模式下运行铁电场效应晶体管进行电荷域内存计算具有降低功耗和抑制读取干扰等优点。本综述文章介绍了 nvCAP 模式下 FeFET 的工作原理。此外,文章还总结了 TCAD 研究结果,以优化 FeFET 结构,最大限度地提高器件在 nvCAP 模式下的性能,其中栅极面积和重叠区决定了导通和关断状态下的电容。接下来讨论了 nvCAP 的可靠性问题。nvCAP 中的 FeFET 显示出 106 个 P/E 周期的初始耐久性,通过执行恢复操作,该耐久性可进一步延长 100 倍。nvCAP 器件在 850 摄氏度的温度下,其新鲜、疲劳和恢复状态的保持时间至少为 1 天,因此适合用于 "内存计算"。
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(Invited) Ferroelectric Nonvolatile Capacitive Synapse for Charge Domain Compute-in-Memory
The ferroelectric field effect transistor (FeFET) can be configured in nvCAP mode to enable a small-signal capacitive readout. Operating the FeFET in nvCAP mode for Charge-domain Compute-in-Memory provides benefits such as reduced power consumption and suppressed read disturb. In this review article, working of FeFET in nvCAP mode is described. Further, the TCAD study results are summarized to optimize the FeFET structure for maximizing the device performance in nvCAP mode, where the gate area and the overlap region decides the ON and OFF state capacitance. Next, the reliability aspects of nvCAP are discussed. The FeFET in nvCAP demonstrates an initial endurance of 106 P/E cycles, which can be further extended by 100× by performing a recovery operation. The nvCAP device shows a retention of at least 1 day at 850C for the fresh, fatigued and recovered state of the device, making it a suitable candidate for Compute-in-Memory.
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