368 纳米紫外微型发光二极管近乎不受尺寸影响的 EQE 演示

Guangying Wang, Shuwen Xie, Yuting Li, Wentao Zhang, Jonathan Vigen, Timothy Shih, Qinchen Lin, Jiarui Gong, Zhenqiang Ma, S. Pasayat, Chirag Gupta
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引用次数: 0

摘要

紫外范围的微型发光二极管因其高稳定性和高能效而被广泛应用。然而,之前的报告显示,随着微型 LED 尺寸的减小,表面体积比的增加会导致 EQE 降低和漏电流增加。在这项工作中,我们研究了 8 × 8 µm2 到 100 × 100 µm2 的 UV-A 微型 LED 的尺寸相关性能。采用基于 ALD 的侧壁钝化技术后,这些器件的漏电流有所降低。在漏电流最小的情况下,进行了系统的 EQE 比较,得到了与尺寸无关的晶圆上 EQE,约为 5.5%。较小尺寸的器件在实验中显示,由于其散热能力得到改善,因此在高电流密度下的 EQE 有所提高。据作者所知,这是小于 10 µm 尺寸的 368 nm 紫外 LED 中报告的最高片上 EQE。本文受版权保护。
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Demonstration of near‐size independent EQE for 368 nm UV micro‐LEDs
UV‐ranged micro‐LEDs are being explored for numerous applications due to their high stability and power efficiency. However, previous reports have shown reduced EQE and increased leakage current due to the increase in surface‐to‐volume ratio with a decrease in the micro‐LED size. In this work, we studied the size‐related performance for UV‐A micro‐LEDs, ranging from 8 × 8 µm2 to 100 × 100 µm2. These devices exhibited reduced leakage current with the implementation of ALD based sidewall passivation. A systematic EQE comparison was performed with minimal leakage current and obtained a size‐independent on‐wafer EQE of around 5.5%. Smaller sized devices experimentally showed enhanced EQE at high current density due to their improved heat dissipation capabilities. To the best of authors’ knowledge, this is the highest reported on‐wafer EQE demonstrated in < 10 µm dimensioned 368 nm UV LEDs.This article is protected by copyright. All rights reserved.
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