滑动边界条件对具有霍尔电流和索雷特-杜富尔效应的锥形导管中杰弗里流体流动的影响

IF 1.8 4区 工程技术 Q3 ENGINEERING, CHEMICAL Chemical Engineering & Technology Pub Date : 2024-05-23 DOI:10.1002/ceat.202400008
Geetha Ramakrishnan, Reddappa Bandi, Ravikumar Seelam, Lakshminarayana Pallavarapu
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引用次数: 0

摘要

本研究考察了锥形通道中蠕动血流的计算分析和数学建模,同时考虑了滑移边界条件、霍尔电流和索雷特-杜富尔力。通过忽略波数并采用长波长近似分析流体模型,研究在低雷诺数体系框架内进行。研究表明,随着流体温度的升高,索雷特数、杜福尔数、普朗特数和施密特数的值呈上升趋势。相反,热滑移参数的上升会导致流体温度下降。研究表明,当质量滑移参数升高时,流体的浓度也会升高。随着速度、浓度滑移参数、索雷特数和杜富尔数的增加,皮肤摩擦系数在 x = 0.55 至 x = 1 的范围内上升。相反,随着热滑移参数的增加,皮肤摩擦系数会降低。所选特征具有现实性,因为它们在医学生物学、生物力学、热交换器、燃气轮机等许多领域都有应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Influence of Slip Boundary Conditions on Jeffrey Fluid Flow in Tapered Conduit with Hall Current and Soret–Dufour Effects

The present work examines the computational analysis and mathematical modeling of peristaltic blood flow in a tapered channel, taking into account slip boundary conditions, Hall current, and Soret–Dufour forces. By neglecting the wave number and employing a long-wavelength approximation to analyze the fluid model, the investigation was conducted within the framework of a low Reynolds number regime. The study reveals that the values of the Soret number, Dufour number, Prandtl number, and Schmidt number exhibit an upward trend as the fluid temperature rises. In contrast, a rise in the thermal slip parameter causes the fluid temperature to fall. It has been shown that when the mass slip parameter increases, the fluid's concentration rises. The skin friction coefficient rises within the range of x = 0.55 to x = 1 as the velocity, concentration slip parameter, Soret number, and Dufour number increase. Conversely, the skin friction coefficient decreases as the thermal slip parameter increases. The selected characteristics exhibit realism since they find use in many fields such as medical biology, biomechanics, heat exchangers, gas turbines, and several other domains.

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来源期刊
Chemical Engineering & Technology
Chemical Engineering & Technology 工程技术-工程:化工
CiteScore
3.80
自引率
4.80%
发文量
315
审稿时长
5.5 months
期刊介绍: This is the journal for chemical engineers looking for first-hand information in all areas of chemical and process engineering. Chemical Engineering & Technology is: Competent with contributions written and refereed by outstanding professionals from around the world. Essential because it is an international forum for the exchange of ideas and experiences. Topical because its articles treat the very latest developments in the field.
期刊最新文献
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