{"title":"控制具有随机结构的固化溶胶-凝胶衍生正型光敏低聚硅倍半氧烷薄膜图案性能的因素","authors":"Mitsuhito Suwa, Takahiro Tanino, Manami Fujii, Masao Kamogawa, Hiromitsu Kozuka","doi":"10.1007/s10971-024-06428-3","DOIUrl":null,"url":null,"abstract":"<div><p>We investigated the effect of heating rates during post-baking on the minimum resolution widths of film patterns prepared from positive-type photosensitive random-structure oligomeric silsesquioxanes (oligo-SQs) with only phenyl (Ph) or both Ph and methyl (Me) groups (Ph group content ≥50 mol%) as substituents. Previously, increasing the Me group content produced 20 μm minimum widths. This was attributed to flow, fusion, and wrinkling during post-baking at 60 °C/min, and partly attributed to enhanced silanol (Si-OH) group reactivity during early stages of post-baking. Here, film patterns for high-definition optical devices fabricated from oligo-SQs with only Ph groups, or with the highest Me group content, produced desired 10 μm widths when heated slowly at 6 °C/min or 3 °C/min, respectively. The decreased widths were attributed to reduced flowability because of enhanced Si-OH group reactivity during heating and the changes and bulkiness of the oligo-SQ molecular structure. The Si-OH reactivity may have been enhanced by the activation of molecular chain motions with increased Me group content and the lower weight-average molecular weight. Structural changes and substituent bulkiness may have also suppressed the chain motions.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":664,"journal":{"name":"Journal of Sol-Gel Science and Technology","volume":null,"pages":null},"PeriodicalIF":2.3000,"publicationDate":"2024-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Factors controlling the performance of film patterns of cured sol-gel-derived positive-type photosensitive oligomeric silsesquioxanes with random structure\",\"authors\":\"Mitsuhito Suwa, Takahiro Tanino, Manami Fujii, Masao Kamogawa, Hiromitsu Kozuka\",\"doi\":\"10.1007/s10971-024-06428-3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>We investigated the effect of heating rates during post-baking on the minimum resolution widths of film patterns prepared from positive-type photosensitive random-structure oligomeric silsesquioxanes (oligo-SQs) with only phenyl (Ph) or both Ph and methyl (Me) groups (Ph group content ≥50 mol%) as substituents. Previously, increasing the Me group content produced 20 μm minimum widths. This was attributed to flow, fusion, and wrinkling during post-baking at 60 °C/min, and partly attributed to enhanced silanol (Si-OH) group reactivity during early stages of post-baking. Here, film patterns for high-definition optical devices fabricated from oligo-SQs with only Ph groups, or with the highest Me group content, produced desired 10 μm widths when heated slowly at 6 °C/min or 3 °C/min, respectively. The decreased widths were attributed to reduced flowability because of enhanced Si-OH group reactivity during heating and the changes and bulkiness of the oligo-SQ molecular structure. The Si-OH reactivity may have been enhanced by the activation of molecular chain motions with increased Me group content and the lower weight-average molecular weight. Structural changes and substituent bulkiness may have also suppressed the chain motions.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>\",\"PeriodicalId\":664,\"journal\":{\"name\":\"Journal of Sol-Gel Science and Technology\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.3000,\"publicationDate\":\"2024-06-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Sol-Gel Science and Technology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10971-024-06428-3\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, CERAMICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Sol-Gel Science and Technology","FirstCategoryId":"88","ListUrlMain":"https://link.springer.com/article/10.1007/s10971-024-06428-3","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, CERAMICS","Score":null,"Total":0}
Factors controlling the performance of film patterns of cured sol-gel-derived positive-type photosensitive oligomeric silsesquioxanes with random structure
We investigated the effect of heating rates during post-baking on the minimum resolution widths of film patterns prepared from positive-type photosensitive random-structure oligomeric silsesquioxanes (oligo-SQs) with only phenyl (Ph) or both Ph and methyl (Me) groups (Ph group content ≥50 mol%) as substituents. Previously, increasing the Me group content produced 20 μm minimum widths. This was attributed to flow, fusion, and wrinkling during post-baking at 60 °C/min, and partly attributed to enhanced silanol (Si-OH) group reactivity during early stages of post-baking. Here, film patterns for high-definition optical devices fabricated from oligo-SQs with only Ph groups, or with the highest Me group content, produced desired 10 μm widths when heated slowly at 6 °C/min or 3 °C/min, respectively. The decreased widths were attributed to reduced flowability because of enhanced Si-OH group reactivity during heating and the changes and bulkiness of the oligo-SQ molecular structure. The Si-OH reactivity may have been enhanced by the activation of molecular chain motions with increased Me group content and the lower weight-average molecular weight. Structural changes and substituent bulkiness may have also suppressed the chain motions.
期刊介绍:
The primary objective of the Journal of Sol-Gel Science and Technology (JSST), the official journal of the International Sol-Gel Society, is to provide an international forum for the dissemination of scientific, technological, and general knowledge about materials processed by chemical nanotechnologies known as the "sol-gel" process. The materials of interest include gels, gel-derived glasses, ceramics in form of nano- and micro-powders, bulk, fibres, thin films and coatings as well as more recent materials such as hybrid organic-inorganic materials and composites. Such materials exhibit a wide range of optical, electronic, magnetic, chemical, environmental, and biomedical properties and functionalities. Methods for producing sol-gel-derived materials and the industrial uses of these materials are also of great interest.