具有双驱动内核的 W 波段叠频四倍频器,排水效率达到 10.3

0 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE microwave and wireless technology letters Pub Date : 2024-04-30 DOI:10.1109/LMWT.2024.3392576
Yaw A. Mensah;Sunil G. Rao;Jeffrey W. Teng;John D. Cressler
{"title":"具有双驱动内核的 W 波段叠频四倍频器,排水效率达到 10.3","authors":"Yaw A. Mensah;Sunil G. Rao;Jeffrey W. Teng;John D. Cressler","doi":"10.1109/LMWT.2024.3392576","DOIUrl":null,"url":null,"abstract":"A \n<inline-formula> <tex-math>$W$ </tex-math></inline-formula>\n-band stacked quadrupler with a dual-driven second-stage doubler is presented that, to the best of the authors’ knowledge, demonstrates the highest \n<inline-formula> <tex-math>$W$ </tex-math></inline-formula>\n-band drain efficiency in silicon while maintaining a competitive output power and harmonic rejection. Implemented in a 90-nm SiGe BiCMOS process, the proposed topology circumvents the need for an interstage balun by using a pair of push–push doublers (PPDs), whose input signals are 90° out-of-phase, as an input stage to drive a third, dual-driven push–push doubler. The stacked dual-driven second stage allows for current reuse between the two stages while maintaining a large input swing on the output stage, promoting a highly efficient design. As a result, the quadrupler achieves a peak conversion gain of 2.2 dB, a peak output power of 6.8 dBm, a harmonic rejection of greater than 31 dBc, and a peak drain efficiency of 10.3%.","PeriodicalId":73297,"journal":{"name":"IEEE microwave and wireless technology letters","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2024-04-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A W-Band Stacked Frequency Quadrupler With a Dual-Driven Core Achieving 10.3% Drain Efficiency\",\"authors\":\"Yaw A. Mensah;Sunil G. Rao;Jeffrey W. Teng;John D. Cressler\",\"doi\":\"10.1109/LMWT.2024.3392576\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A \\n<inline-formula> <tex-math>$W$ </tex-math></inline-formula>\\n-band stacked quadrupler with a dual-driven second-stage doubler is presented that, to the best of the authors’ knowledge, demonstrates the highest \\n<inline-formula> <tex-math>$W$ </tex-math></inline-formula>\\n-band drain efficiency in silicon while maintaining a competitive output power and harmonic rejection. Implemented in a 90-nm SiGe BiCMOS process, the proposed topology circumvents the need for an interstage balun by using a pair of push–push doublers (PPDs), whose input signals are 90° out-of-phase, as an input stage to drive a third, dual-driven push–push doubler. The stacked dual-driven second stage allows for current reuse between the two stages while maintaining a large input swing on the output stage, promoting a highly efficient design. As a result, the quadrupler achieves a peak conversion gain of 2.2 dB, a peak output power of 6.8 dBm, a harmonic rejection of greater than 31 dBc, and a peak drain efficiency of 10.3%.\",\"PeriodicalId\":73297,\"journal\":{\"name\":\"IEEE microwave and wireless technology letters\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-04-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE microwave and wireless technology letters\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10510459/\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"0\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE microwave and wireless technology letters","FirstCategoryId":"1085","ListUrlMain":"https://ieeexplore.ieee.org/document/10510459/","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"0","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

摘要

本文介绍了一种带有双驱动第二级倍增器的 W$ - 频带叠加式四倍增器,据作者所知,该器件在硅材料中实现了最高的 W$ - 频带耗尽效率,同时保持了极具竞争力的输出功率和谐波抑制能力。所提出的拓扑结构采用 90 纳米 SiGe BiCMOS 工艺,通过使用一对输入信号为 90° 失相的推挽倍增器 (PPD) 作为输入级来驱动第三个双驱动推挽倍增器,从而避免了对级间平衡器的需求。堆叠式双驱动第二级允许在两级之间重复使用电流,同时在输出级上保持较大的输入摆幅,从而提高了设计效率。因此,四倍器的峰值转换增益达到 2.2 dB,峰值输出功率为 6.8 dBm,谐波抑制大于 31 dBc,峰值漏极效率为 10.3%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
A W-Band Stacked Frequency Quadrupler With a Dual-Driven Core Achieving 10.3% Drain Efficiency
A $W$ -band stacked quadrupler with a dual-driven second-stage doubler is presented that, to the best of the authors’ knowledge, demonstrates the highest $W$ -band drain efficiency in silicon while maintaining a competitive output power and harmonic rejection. Implemented in a 90-nm SiGe BiCMOS process, the proposed topology circumvents the need for an interstage balun by using a pair of push–push doublers (PPDs), whose input signals are 90° out-of-phase, as an input stage to drive a third, dual-driven push–push doubler. The stacked dual-driven second stage allows for current reuse between the two stages while maintaining a large input swing on the output stage, promoting a highly efficient design. As a result, the quadrupler achieves a peak conversion gain of 2.2 dB, a peak output power of 6.8 dBm, a harmonic rejection of greater than 31 dBc, and a peak drain efficiency of 10.3%.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
CiteScore
6.00
自引率
0.00%
发文量
0
期刊最新文献
Table of Contents IEEE Microwave and Wireless Technology Letters Information for Authors IEEE Microwave and Wireless Technology Letters publication TechRxiv: Share Your Preprint Research with the World IEEE Open Access Publishing
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1