溅射碳化硅薄膜的结构和光学特性研究

Mukesh Kumar Mukesh Kumar
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引用次数: 0

摘要

本研究探讨了使用射频磁控溅射技术在硅(100)和玻璃基底上沉积非晶碳化硅(a-SiC)薄膜的过程。溅射功率从 100 W 变为 250 W,以研究其对 a-SiC 薄膜特性的影响。拉曼光谱显示了 a-SiC 和碳簇的形成。在 100 瓦功率下沉积的薄膜清楚地显示出横向光学(TO)和纵向光学(LO)声子模式的存在。随着溅射功率的增加,a-SiC 薄膜的平均粗糙度呈上升趋势。用紫外-可见分光光度计测量发现,随着溅射功率的降低,a-SiC 薄膜的光带隙增加到 2.45 eV。所有 a-SiC 薄膜都具有高透明度。光致发光 (PL) 光谱结果与紫外-可见光谱观察到的数据一致
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Studies of structural and optical properties of sputtered SiC thin films
The present study explored the deposition of amorphous silicon carbide (a-SiC) thin films on Si (100) and glass substrates using RF-magnetron sputtering. The sputtering power is changed from 100 to 250 W to study its influence on the characteristics of a-SiC thin films. Raman spectroscopy reveals the formation of a-SiC as well as carbon clusters. The film deposited at 100 W clearly shows the presence of both transverse optical (TO) and longitudinal optical (LO) phonon modes. The average roughness of the a-SiC films found to follow an increasing trend with increase in the sputtering power. The optical band gap of the a-SiC films measured by UV-Visible spectrophotometer was found to increase up to 2.45 eV with decrease in sputtering power. All a-SiC thin films were highly transparent. The Photoluminescence (PL) spectroscopy results were in agreement with the data observed by UV-Visible spectroscopy
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来源期刊
Zastita materijala
Zastita materijala Materials Science-General Materials Science
CiteScore
0.80
自引率
0.00%
发文量
26
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