{"title":"冷电极金属氧化物电阻式随机存取存储器","authors":"Jifang Cao, Bing Chen, Zhijiang Wang, Junru Qu, Jiayi Zhao, Rongzong Shen, Xiao Yu, Zhiping Yu, Fei Liu","doi":"10.1063/5.0214593","DOIUrl":null,"url":null,"abstract":"To reduce the leakage and power consumption of metal–oxide resistive random access memory (RRAM), we propose and fabricate a cold-electrode (CE) RRAM (CE-RRAM) by extending the mechanism of cold-source FETs. First-principles calculations show that the n-Si/TiN composite CE can filter electrons with energy within the Si bandgap, which contribute to leakage current. A n-Si/TiN/HfOx/Pt CE-RRAM with low leakage current and large on/off current ratio was designed and fabricated. Comparative analysis with conventional RRAM demonstrates over a 100-fold reduction in leakage current in a high resistance state and a tenfold improvement in the Ion/Ioff ratio. Additionally, the CE-RRAM effectively suppresses the overshoot effect in terminal I–V characteristics and exhibits good endurance, maintaining a 100 Ion/Ioff ratio after 104 cycles. Furthermore, even after 104 s at 100 °C, the state remains unchanged. Moreover, the CE-RRAM demonstrates its multi-level storage capability.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":null,"pages":null},"PeriodicalIF":3.5000,"publicationDate":"2024-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A cold-electrode metal–oxide resistive random access memory\",\"authors\":\"Jifang Cao, Bing Chen, Zhijiang Wang, Junru Qu, Jiayi Zhao, Rongzong Shen, Xiao Yu, Zhiping Yu, Fei Liu\",\"doi\":\"10.1063/5.0214593\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"To reduce the leakage and power consumption of metal–oxide resistive random access memory (RRAM), we propose and fabricate a cold-electrode (CE) RRAM (CE-RRAM) by extending the mechanism of cold-source FETs. First-principles calculations show that the n-Si/TiN composite CE can filter electrons with energy within the Si bandgap, which contribute to leakage current. A n-Si/TiN/HfOx/Pt CE-RRAM with low leakage current and large on/off current ratio was designed and fabricated. Comparative analysis with conventional RRAM demonstrates over a 100-fold reduction in leakage current in a high resistance state and a tenfold improvement in the Ion/Ioff ratio. Additionally, the CE-RRAM effectively suppresses the overshoot effect in terminal I–V characteristics and exhibits good endurance, maintaining a 100 Ion/Ioff ratio after 104 cycles. Furthermore, even after 104 s at 100 °C, the state remains unchanged. Moreover, the CE-RRAM demonstrates its multi-level storage capability.\",\"PeriodicalId\":8094,\"journal\":{\"name\":\"Applied Physics Letters\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":3.5000,\"publicationDate\":\"2024-07-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applied Physics Letters\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1063/5.0214593\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1063/5.0214593","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
A cold-electrode metal–oxide resistive random access memory
To reduce the leakage and power consumption of metal–oxide resistive random access memory (RRAM), we propose and fabricate a cold-electrode (CE) RRAM (CE-RRAM) by extending the mechanism of cold-source FETs. First-principles calculations show that the n-Si/TiN composite CE can filter electrons with energy within the Si bandgap, which contribute to leakage current. A n-Si/TiN/HfOx/Pt CE-RRAM with low leakage current and large on/off current ratio was designed and fabricated. Comparative analysis with conventional RRAM demonstrates over a 100-fold reduction in leakage current in a high resistance state and a tenfold improvement in the Ion/Ioff ratio. Additionally, the CE-RRAM effectively suppresses the overshoot effect in terminal I–V characteristics and exhibits good endurance, maintaining a 100 Ion/Ioff ratio after 104 cycles. Furthermore, even after 104 s at 100 °C, the state remains unchanged. Moreover, the CE-RRAM demonstrates its multi-level storage capability.
期刊介绍:
Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology.
In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics.
APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field.
Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.