Chong-Biao Tian, Li Wang, Máté Vass, Xiao-Kun Wang, Wan Dong, Yuan-Hong Song, You-Nian Wang and Julian Schulze
{"title":"电负性电容耦合射频等离子体中的脱离诱导模式","authors":"Chong-Biao Tian, Li Wang, Máté Vass, Xiao-Kun Wang, Wan Dong, Yuan-Hong Song, You-Nian Wang and Julian Schulze","doi":"10.1088/1361-6595/ad5df8","DOIUrl":null,"url":null,"abstract":"Insights into the spatio-temporally resolved electron power absorption dynamics in capacitively coupled radio-frequency plasmas are essential for understanding the fundamentals of their operation and as a basis for knowledge-based plasma process development. Similar to the γ-mode, an ionization maximum is observed at the sheath edge around the time of maximum sheath voltage in electronegative oxygen discharges at a pressure of 300 Pa. Based on Particle-in-Cell/Monte Carlo Collisions (PIC/MCC) simulations, we demonstrate that this maximum is not only caused by secondary electrons emitted at the electrode and collisionally multiplied inside the sheath. In fact, it also occurs in the complete absence of secondary electrons in the simulation, and is caused by the generation of ions by electron attachment close to the electrode during the local sheath collapse. These negative ions are accelerated towards the plasma bulk by the sheath electric field during sheath expansion. By electron detachment from these negative ions, electrons are generated inside the sheath and are accelerated towards the plasma bulk by the instantaneous sheath electric field—similarly to secondary electrons. Ionization is also observed in the plasma bulk and caused by electrons generated by detachment and accelerated by the high drift-and ambipolar electric fields. This detachment-induced electron power absorption is found to have significant effects on the discharge in the presence and absence of secondary electron emission. Its fundamentals are understood based on an analysis of the spatio-temporal electron and power absorption dynamics as well as the trajectory of selected ions close to the electrode.","PeriodicalId":20192,"journal":{"name":"Plasma Sources Science and Technology","volume":"17 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The detachment-induced mode in electronegative capacitively coupled radio-frequency plasmas\",\"authors\":\"Chong-Biao Tian, Li Wang, Máté Vass, Xiao-Kun Wang, Wan Dong, Yuan-Hong Song, You-Nian Wang and Julian Schulze\",\"doi\":\"10.1088/1361-6595/ad5df8\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Insights into the spatio-temporally resolved electron power absorption dynamics in capacitively coupled radio-frequency plasmas are essential for understanding the fundamentals of their operation and as a basis for knowledge-based plasma process development. Similar to the γ-mode, an ionization maximum is observed at the sheath edge around the time of maximum sheath voltage in electronegative oxygen discharges at a pressure of 300 Pa. Based on Particle-in-Cell/Monte Carlo Collisions (PIC/MCC) simulations, we demonstrate that this maximum is not only caused by secondary electrons emitted at the electrode and collisionally multiplied inside the sheath. In fact, it also occurs in the complete absence of secondary electrons in the simulation, and is caused by the generation of ions by electron attachment close to the electrode during the local sheath collapse. These negative ions are accelerated towards the plasma bulk by the sheath electric field during sheath expansion. By electron detachment from these negative ions, electrons are generated inside the sheath and are accelerated towards the plasma bulk by the instantaneous sheath electric field—similarly to secondary electrons. Ionization is also observed in the plasma bulk and caused by electrons generated by detachment and accelerated by the high drift-and ambipolar electric fields. This detachment-induced electron power absorption is found to have significant effects on the discharge in the presence and absence of secondary electron emission. Its fundamentals are understood based on an analysis of the spatio-temporal electron and power absorption dynamics as well as the trajectory of selected ions close to the electrode.\",\"PeriodicalId\":20192,\"journal\":{\"name\":\"Plasma Sources Science and Technology\",\"volume\":\"17 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-07-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Plasma Sources Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6595/ad5df8\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Sources Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6595/ad5df8","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
了解电容耦合射频等离子体中电子功率吸收的时空分辨动态,对于理解其运行的基本原理以及作为基于知识的等离子体工艺开发的基础至关重要。与 γ 模式类似,在 300 Pa 压力下的负电性氧放电中,在最大鞘电压附近的鞘边缘也观察到了电离最大值。根据粒子在细胞内/蒙特卡罗碰撞(PIC/MCC)模拟,我们证明了这一最大值不仅是由电极发射的二次电子在鞘内碰撞倍增引起的。事实上,在模拟中完全没有二次电子的情况下,也会出现这种最大值,其原因是在局部鞘塌缩过程中,靠近电极的电子附着产生了离子。在鞘膨胀过程中,这些负离子被鞘电场加速向等离子体块移动。电子从这些负离子脱离后,在鞘内产生电子,并在瞬时鞘电场的作用下加速向等离子体块移动--这与次级电子类似。在等离子体体中也能观察到电离现象,电离是由脱离产生的电子在高漂移电场和伏极电场的作用下加速产生的。研究发现,无论是否存在二次电子发射,这种脱离引起的电子功率吸收都会对放电产生重大影响。根据对电子和功率吸收的时空动态以及靠近电极的选定离子轨迹的分析,可以了解其基本原理。
The detachment-induced mode in electronegative capacitively coupled radio-frequency plasmas
Insights into the spatio-temporally resolved electron power absorption dynamics in capacitively coupled radio-frequency plasmas are essential for understanding the fundamentals of their operation and as a basis for knowledge-based plasma process development. Similar to the γ-mode, an ionization maximum is observed at the sheath edge around the time of maximum sheath voltage in electronegative oxygen discharges at a pressure of 300 Pa. Based on Particle-in-Cell/Monte Carlo Collisions (PIC/MCC) simulations, we demonstrate that this maximum is not only caused by secondary electrons emitted at the electrode and collisionally multiplied inside the sheath. In fact, it also occurs in the complete absence of secondary electrons in the simulation, and is caused by the generation of ions by electron attachment close to the electrode during the local sheath collapse. These negative ions are accelerated towards the plasma bulk by the sheath electric field during sheath expansion. By electron detachment from these negative ions, electrons are generated inside the sheath and are accelerated towards the plasma bulk by the instantaneous sheath electric field—similarly to secondary electrons. Ionization is also observed in the plasma bulk and caused by electrons generated by detachment and accelerated by the high drift-and ambipolar electric fields. This detachment-induced electron power absorption is found to have significant effects on the discharge in the presence and absence of secondary electron emission. Its fundamentals are understood based on an analysis of the spatio-temporal electron and power absorption dynamics as well as the trajectory of selected ions close to the electrode.