{"title":"使用金属/聚合物混合键合的 HRDL 互连技术及其特点","authors":"Yu-Lun Liu;Chien-Kang Hsiung;Tzu-Han Sun;Chun-Ta Li;Yuan-Chiu Huang;Yu-Tao Yang;Kuan-Neng Chen","doi":"10.1109/TMAT.2024.3417888","DOIUrl":null,"url":null,"abstract":"This article aims to comprehensively explore silicon, glass, organic, and RDL (Redistribution Layer) interposers, comparing their technological features, advantages, and associated challenges. Additionally, a pioneering technology, termed Hyper RDL interposer (HRDL), which integrates temporary bonding and low-temperature hybrid bonding techniques to create an RDL interposer with low warpage, high layer count, and minimal thermal accumulation effects, is introduced through new research results. The forthcoming discussion will rigorously examine the impact of interposer technologies in the semiconductor industry and advanced technology sectors, facilitating progress in critical areas, including high-performance computing (HPC), artificial intelligence (AI), and high-bandwidth applications.","PeriodicalId":100642,"journal":{"name":"IEEE Transactions on Materials for Electron Devices","volume":"1 ","pages":"15-22"},"PeriodicalIF":0.0000,"publicationDate":"2024-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The HRDL Interposer Technology Using Metal/Polymer Hybrid Bonding and Its Characteristics\",\"authors\":\"Yu-Lun Liu;Chien-Kang Hsiung;Tzu-Han Sun;Chun-Ta Li;Yuan-Chiu Huang;Yu-Tao Yang;Kuan-Neng Chen\",\"doi\":\"10.1109/TMAT.2024.3417888\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This article aims to comprehensively explore silicon, glass, organic, and RDL (Redistribution Layer) interposers, comparing their technological features, advantages, and associated challenges. Additionally, a pioneering technology, termed Hyper RDL interposer (HRDL), which integrates temporary bonding and low-temperature hybrid bonding techniques to create an RDL interposer with low warpage, high layer count, and minimal thermal accumulation effects, is introduced through new research results. The forthcoming discussion will rigorously examine the impact of interposer technologies in the semiconductor industry and advanced technology sectors, facilitating progress in critical areas, including high-performance computing (HPC), artificial intelligence (AI), and high-bandwidth applications.\",\"PeriodicalId\":100642,\"journal\":{\"name\":\"IEEE Transactions on Materials for Electron Devices\",\"volume\":\"1 \",\"pages\":\"15-22\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-06-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Materials for Electron Devices\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10568356/\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Materials for Electron Devices","FirstCategoryId":"1085","ListUrlMain":"https://ieeexplore.ieee.org/document/10568356/","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The HRDL Interposer Technology Using Metal/Polymer Hybrid Bonding and Its Characteristics
This article aims to comprehensively explore silicon, glass, organic, and RDL (Redistribution Layer) interposers, comparing their technological features, advantages, and associated challenges. Additionally, a pioneering technology, termed Hyper RDL interposer (HRDL), which integrates temporary bonding and low-temperature hybrid bonding techniques to create an RDL interposer with low warpage, high layer count, and minimal thermal accumulation effects, is introduced through new research results. The forthcoming discussion will rigorously examine the impact of interposer technologies in the semiconductor industry and advanced technology sectors, facilitating progress in critical areas, including high-performance computing (HPC), artificial intelligence (AI), and high-bandwidth applications.