Caterina Summonte, Francesco Borgatti, Cristiano Albonetti
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引用次数: 0
摘要
在用于分析有机电子设备的公式中,半导体有机薄膜的相对介电常数值通常是假定的,而不是测量的,尽管它是正确解释的基本参数。这对于由离散分子层构成的超薄薄膜来说尤其如此。在这项研究中,我们使用了光谱椭偏仪和扫描电容显微镜来研究 N,N'-双(正辛基)-x:y,二氰基过炔-3,4:9,10-双(二甲酰亚胺)薄膜。相对介电常数随厚度的变化呈非单调趋势:一个分子层的介电常数等于 2.1,随着厚度的增加,介电常数在 3.2 时达到饱和。当覆盖层介于第三层和第四层之间时,介电常数会达到最大值,相当于大体积介电常数。在这一范围内,生长模式从 Frank-Van der Merwe(二维生长)转换为 Volmer-Weber 模式(三维生长);此外,相对于最初的边缘生长,分子构型呈现出弯曲/扭曲的几何形状。这些结果确定了介电常数的形态依赖性,尤其是在基底界面附近,在与基底界面保持一定距离后,介电常数就会消失。
Thickness-Dependent Relative Dielectric Constant of Organic Ultrathin Films.
In formulas employed for analysis of organic electronic devices, the relative dielectric constant value of the semiconductor organic films is often assumed rather than measured, even though it is a fundamental parameter for a correct interpretation. This is particularly true for ultrathin films made of discrete molecular layers. In this work, Spectroscopy Ellipsometry and Scanning Capacitance Microscopy were used to study thin films made of N,N'-bis(n-octyl)-x:y,dicyanoperylene-3,4 : 9,10-bis(dicarboximide). The relative dielectric constant presents a non-monotonic trend with thickness: it is equal to 2.1 for one molecular layer, saturating at 3.2 for increasing thickness. This maximum value, equivalent to the bulk one, occurs when the coverage is in between the third to the fourth layer. In this range, the growth switches from a Frank-Van der Merwe (2D growth) to a Volmer-Weber mode (3D growth); in addition, the molecular configuration assumes a bent/distorted geometry with respect to the initial edge-on one. These results establish a morphological dependence of the dielectric constant, especially in the vicinity of the substrate interface, that disappears at a certain distance from it.
期刊介绍:
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