石英晶体微天平 (QCM) 法研究部分保护聚(4-羟基苯乙烯)在有机显影剂中的溶解动力学

Yuko Tsutsui Ito, Kyoko Watanabe, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu
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摘要

固体薄膜中的聚(4-羟基苯乙烯)(PHS)分子通过极性和非极性分子相互作用和氢键相互连接。虽然酚羟基的解离是 PHS 薄膜在四甲基氢氧化铵(TMAH)水性显影剂中溶解的主要原因,但明确其他相互作用的影响也很重要。在本研究中,我们采用石英晶体微天平法研究了部分保护 PHS 在有机显影剂中的溶解动力学,以加深对化学放大抗蚀剂溶解动力学的基本认识。测量了酚羟基在溶剂中的溶解动力学,在溶剂中酚羟基几乎不解离。在 50% 的甲醇水溶液显影剂中,观察到了较大的膨胀。通过降低显影剂的极性,溶解动力学发生了显著变化。在乙酸己酯中,PHS 薄膜的溶解动力学与在 TMAH 水性显影剂中的溶解动力学相似,但溶解机理不同。
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Dissolution dynamics of partially protected poly(4-hydroxystyrene) in organic developers investigated by quartz crystal microbalance (QCM) method
Poly(4-hydroxystyrene) (PHS) molecules in solid films are connected each other through polar and nonpolar molecular interaction and hydrogen bonds. Although the dissociation of phenolic hydroxyl groups plays the major role in the dissolution of PHS films in tetramethylammonium hydroxide (TMAH) aqueous developer, it is important to clarify the effects of other interactions. In this study, we investigated the dissolution dynamics of partially protected PHS in organic developers by a quartz crystal microbalance method to deepen the fundamental understanding of the dissolution dynamics of chemically amplified resists. The dissolution dynamics in the solvents, in which the phenolic hydroxyl groups are hardly dissociated, was measured. In 50 vol% methanol aqueous developer, a large swelling was observed. By decreasing the polarity of developer, the dissolution dynamics was significantly changed. In the hexyl acetate, the dissolution kinetics of PHS films became similar to that in TMAH aqueous developer although the dissolution mechanism is different.
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