通过原子力显微镜纳米光刻技术在 MoS2 上创建纳米级带状材料并对其进行表征

IF 1.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY ECS Journal of Solid State Science and Technology Pub Date : 2024-07-18 DOI:10.1149/2162-8777/ad60ff
Yangyang Guo, Jing Sun, Cheng Wang, Yanni Yang and Junjie Wang
{"title":"通过原子力显微镜纳米光刻技术在 MoS2 上创建纳米级带状材料并对其进行表征","authors":"Yangyang Guo, Jing Sun, Cheng Wang, Yanni Yang and Junjie Wang","doi":"10.1149/2162-8777/ad60ff","DOIUrl":null,"url":null,"abstract":"The atomic force microscope (AFM) has been widely used for fabricating the nanoscale oxide ribbons on various materials surface. Herein, we first conducted local anodic oxidation (LAO) lithography on two-dimensional nanomaterial (2D), i.e. multilayer MoS2, using AFM. The correlation of patterning behavior on the MoS2 flakes between the lithography conditions was investigated. The height and full width half maximum (FWHM) increase linearly with increasing tip voltage, even at different tip speeds, which is consistent with the results obtained from the Cabrera-Mott oxidation theory. The size of the clear relation decreases linearly with increasing tip speed, indicating that longer tip writing patterns result in more oxidation. The formation mechanism of the patterned oxide lines is presented along with LAO reaction processes.The final LAO lithography products have been demonstrated to be MoO2 and MoO3 by micro-Raman spectroscopy. These results show that LAO lithography using AFM is an effective technique for nanofabrication of nanodevices.","PeriodicalId":11496,"journal":{"name":"ECS Journal of Solid State Science and Technology","volume":"45 1","pages":""},"PeriodicalIF":1.8000,"publicationDate":"2024-07-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Creation and Characterization of Nanoscale Ribbons on MoS2 by Atomic Force Microscope Nanolithography\",\"authors\":\"Yangyang Guo, Jing Sun, Cheng Wang, Yanni Yang and Junjie Wang\",\"doi\":\"10.1149/2162-8777/ad60ff\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The atomic force microscope (AFM) has been widely used for fabricating the nanoscale oxide ribbons on various materials surface. Herein, we first conducted local anodic oxidation (LAO) lithography on two-dimensional nanomaterial (2D), i.e. multilayer MoS2, using AFM. The correlation of patterning behavior on the MoS2 flakes between the lithography conditions was investigated. The height and full width half maximum (FWHM) increase linearly with increasing tip voltage, even at different tip speeds, which is consistent with the results obtained from the Cabrera-Mott oxidation theory. The size of the clear relation decreases linearly with increasing tip speed, indicating that longer tip writing patterns result in more oxidation. The formation mechanism of the patterned oxide lines is presented along with LAO reaction processes.The final LAO lithography products have been demonstrated to be MoO2 and MoO3 by micro-Raman spectroscopy. These results show that LAO lithography using AFM is an effective technique for nanofabrication of nanodevices.\",\"PeriodicalId\":11496,\"journal\":{\"name\":\"ECS Journal of Solid State Science and Technology\",\"volume\":\"45 1\",\"pages\":\"\"},\"PeriodicalIF\":1.8000,\"publicationDate\":\"2024-07-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ECS Journal of Solid State Science and Technology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1149/2162-8777/ad60ff\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ECS Journal of Solid State Science and Technology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1149/2162-8777/ad60ff","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

原子力显微镜(AFM)已被广泛用于在各种材料表面制备纳米级氧化物带。在此,我们首次利用原子力显微镜在二维纳米材料(即多层 MoS2)上进行了局部阳极氧化(LAO)光刻。研究了不同光刻条件下 MoS2 薄片上图案化行为的相关性。高度和全宽半最大值(FWHM)随着针尖电压的增加而线性增加,即使在不同的针尖速度下也是如此,这与卡布雷拉-莫特氧化理论得出的结果一致。清晰关系的大小随针尖速度的增加而线性减小,这表明较长的针尖书写图案会导致更多的氧化。通过微拉曼光谱分析,最终的 LAO 光刻产物被证明是 MoO2 和 MoO3。这些结果表明,使用原子力显微镜进行 LAO 光刻是一种有效的纳米器件制造技术。
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Creation and Characterization of Nanoscale Ribbons on MoS2 by Atomic Force Microscope Nanolithography
The atomic force microscope (AFM) has been widely used for fabricating the nanoscale oxide ribbons on various materials surface. Herein, we first conducted local anodic oxidation (LAO) lithography on two-dimensional nanomaterial (2D), i.e. multilayer MoS2, using AFM. The correlation of patterning behavior on the MoS2 flakes between the lithography conditions was investigated. The height and full width half maximum (FWHM) increase linearly with increasing tip voltage, even at different tip speeds, which is consistent with the results obtained from the Cabrera-Mott oxidation theory. The size of the clear relation decreases linearly with increasing tip speed, indicating that longer tip writing patterns result in more oxidation. The formation mechanism of the patterned oxide lines is presented along with LAO reaction processes.The final LAO lithography products have been demonstrated to be MoO2 and MoO3 by micro-Raman spectroscopy. These results show that LAO lithography using AFM is an effective technique for nanofabrication of nanodevices.
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来源期刊
ECS Journal of Solid State Science and Technology
ECS Journal of Solid State Science and Technology MATERIALS SCIENCE, MULTIDISCIPLINARY-PHYSICS, APPLIED
CiteScore
4.50
自引率
13.60%
发文量
455
期刊介绍: The ECS Journal of Solid State Science and Technology (JSS) was launched in 2012, and publishes outstanding research covering fundamental and applied areas of solid state science and technology, including experimental and theoretical aspects of the chemistry and physics of materials and devices. JSS has five topical interest areas: carbon nanostructures and devices dielectric science and materials electronic materials and processing electronic and photonic devices and systems luminescence and display materials, devices and processing.
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