{"title":"磁控溅射法优化 Ti2O3 薄膜并研究其光电性能","authors":"Wenwei Wang, Jialiang He, Yingbang Yao","doi":"10.1111/ijac.14857","DOIUrl":null,"url":null,"abstract":"In this study, Ti<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> thin films were successfully produced using magnetron sputtering. Through orthogonal gradient experiments, the impact of substrate temperature, sputtering vacuum, RF power, and sputtering duration on surface morphology, roughness, physical structure, and resistivity was investigated. Various analytical techniques were employed, including AFM and SEM for surface morphology observation, XRD and Raman for qualitative physical structure analysis, XPS for elemental valence examination, and the four‐probe method for resistivity measurements. The study identified optimal growth conditions for Ti<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> films, demonstrating a low resistivity of 2.66 × 10<jats:sup>−3</jats:sup> Ω cm under the following conditions: RF power of 200 W, sputtering vacuum of .6 Pa, substrate temperature of 600°C, and sputtering duration of 60 min. Additionally, the sensor arrays were efficiently fabricated using the Lift‐off method to evaluate the photoelectric performance of the films. A light responsiveness of approximately 6 µA/W was observed in the device when illuminated with 950 nm light for 10 s. This finding carries important implications for the use of Ti<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> thin films in future photoelectric devices.","PeriodicalId":13903,"journal":{"name":"International Journal of Applied Ceramic Technology","volume":null,"pages":null},"PeriodicalIF":1.8000,"publicationDate":"2024-07-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optimization of Ti2O3 thin films by magnetron sputtering and study of their photoelectric performance\",\"authors\":\"Wenwei Wang, Jialiang He, Yingbang Yao\",\"doi\":\"10.1111/ijac.14857\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this study, Ti<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> thin films were successfully produced using magnetron sputtering. Through orthogonal gradient experiments, the impact of substrate temperature, sputtering vacuum, RF power, and sputtering duration on surface morphology, roughness, physical structure, and resistivity was investigated. Various analytical techniques were employed, including AFM and SEM for surface morphology observation, XRD and Raman for qualitative physical structure analysis, XPS for elemental valence examination, and the four‐probe method for resistivity measurements. The study identified optimal growth conditions for Ti<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> films, demonstrating a low resistivity of 2.66 × 10<jats:sup>−3</jats:sup> Ω cm under the following conditions: RF power of 200 W, sputtering vacuum of .6 Pa, substrate temperature of 600°C, and sputtering duration of 60 min. Additionally, the sensor arrays were efficiently fabricated using the Lift‐off method to evaluate the photoelectric performance of the films. A light responsiveness of approximately 6 µA/W was observed in the device when illuminated with 950 nm light for 10 s. This finding carries important implications for the use of Ti<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> thin films in future photoelectric devices.\",\"PeriodicalId\":13903,\"journal\":{\"name\":\"International Journal of Applied Ceramic Technology\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.8000,\"publicationDate\":\"2024-07-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Journal of Applied Ceramic Technology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1111/ijac.14857\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, CERAMICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Applied Ceramic Technology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1111/ijac.14857","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, CERAMICS","Score":null,"Total":0}
Optimization of Ti2O3 thin films by magnetron sputtering and study of their photoelectric performance
In this study, Ti2O3 thin films were successfully produced using magnetron sputtering. Through orthogonal gradient experiments, the impact of substrate temperature, sputtering vacuum, RF power, and sputtering duration on surface morphology, roughness, physical structure, and resistivity was investigated. Various analytical techniques were employed, including AFM and SEM for surface morphology observation, XRD and Raman for qualitative physical structure analysis, XPS for elemental valence examination, and the four‐probe method for resistivity measurements. The study identified optimal growth conditions for Ti2O3 films, demonstrating a low resistivity of 2.66 × 10−3 Ω cm under the following conditions: RF power of 200 W, sputtering vacuum of .6 Pa, substrate temperature of 600°C, and sputtering duration of 60 min. Additionally, the sensor arrays were efficiently fabricated using the Lift‐off method to evaluate the photoelectric performance of the films. A light responsiveness of approximately 6 µA/W was observed in the device when illuminated with 950 nm light for 10 s. This finding carries important implications for the use of Ti2O3 thin films in future photoelectric devices.
期刊介绍:
The International Journal of Applied Ceramic Technology publishes cutting edge applied research and development work focused on commercialization of engineered ceramics, products and processes. The publication also explores the barriers to commercialization, design and testing, environmental health issues, international standardization activities, databases, and cost models. Designed to get high quality information to end-users quickly, the peer process is led by an editorial board of experts from industry, government, and universities. Each issue focuses on a high-interest, high-impact topic plus includes a range of papers detailing applications of ceramics. Papers on all aspects of applied ceramics are welcome including those in the following areas:
Nanotechnology applications;
Ceramic Armor;
Ceramic and Technology for Energy Applications (e.g., Fuel Cells, Batteries, Solar, Thermoelectric, and HT Superconductors);
Ceramic Matrix Composites;
Functional Materials;
Thermal and Environmental Barrier Coatings;
Bioceramic Applications;
Green Manufacturing;
Ceramic Processing;
Glass Technology;
Fiber optics;
Ceramics in Environmental Applications;
Ceramics in Electronic, Photonic and Magnetic Applications;