{"title":"利用 XPS 和 HREELS 研究氮、氧和氢键以及环境暴露氮端 H-金刚石 (111) 表面的热稳定性","authors":"Mohan Kumar Kuntumalla, Shaul Michaelson, Alon Hoffman","doi":"10.1016/j.susc.2024.122555","DOIUrl":null,"url":null,"abstract":"<div><p>We report on the chemical composition, bonding, and in-vacuum thermal stability (up to 1000 °C) of nitrogen plasma terminated H-Diamond(111) (H-Di(111)) surfaces followed by ambient exposure. The nitrogen-plasma exposures include radio frequency (RF) (at pressure: 3 × 10<sup>−2</sup> (damaging) and 7 × 10<sup>−2</sup> Torr (non-damaging)) and microwave (MW) nitrogen plasmas and studied by X-ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HREELS). The largest nitrogen intake was observed upon exposure to RF(N<sub>2</sub>) damaging plasma, followed by MW(N<sub>2</sub>) and non-damaging RF(N<sub>2</sub>) plasmas. A similar trend follows the adsorption of adventitious oxygen. The XPS analysis shows that most of the adventitious oxygen is adsorbed in a CO<sub>x</sub> configuration upon nitride surfaces exposure to ambient conditions. However, upon high temperature annealing of the damaging RF(N<sub>2</sub>) plasma exposed surface, some NO<sub>x</sub> (species) were detected by XPS. From the HREELS analysis, the hydrogen adsorbed on the H-Di(111) is not fully removed by exposure to the different nitrogen plasmas. These measurements show that NH(ads) species are formed on the surface and are desorbed upon vacuum annealing in the 500–700 °C range. This study may be of importance in all ex-situ applications influenced by the near-surface physicochemical and electronic properties of nitrogen-terminated H-Di(111) surfaces.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"749 ","pages":"Article 122555"},"PeriodicalIF":2.1000,"publicationDate":"2024-07-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Nitrogen, oxygen, and hydrogen bonding and thermal stability of ambient exposed nitrogen-terminated H-diamond (111) surfaces studied by XPS and HREELS\",\"authors\":\"Mohan Kumar Kuntumalla, Shaul Michaelson, Alon Hoffman\",\"doi\":\"10.1016/j.susc.2024.122555\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>We report on the chemical composition, bonding, and in-vacuum thermal stability (up to 1000 °C) of nitrogen plasma terminated H-Diamond(111) (H-Di(111)) surfaces followed by ambient exposure. The nitrogen-plasma exposures include radio frequency (RF) (at pressure: 3 × 10<sup>−2</sup> (damaging) and 7 × 10<sup>−2</sup> Torr (non-damaging)) and microwave (MW) nitrogen plasmas and studied by X-ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HREELS). The largest nitrogen intake was observed upon exposure to RF(N<sub>2</sub>) damaging plasma, followed by MW(N<sub>2</sub>) and non-damaging RF(N<sub>2</sub>) plasmas. A similar trend follows the adsorption of adventitious oxygen. The XPS analysis shows that most of the adventitious oxygen is adsorbed in a CO<sub>x</sub> configuration upon nitride surfaces exposure to ambient conditions. However, upon high temperature annealing of the damaging RF(N<sub>2</sub>) plasma exposed surface, some NO<sub>x</sub> (species) were detected by XPS. From the HREELS analysis, the hydrogen adsorbed on the H-Di(111) is not fully removed by exposure to the different nitrogen plasmas. These measurements show that NH(ads) species are formed on the surface and are desorbed upon vacuum annealing in the 500–700 °C range. This study may be of importance in all ex-situ applications influenced by the near-surface physicochemical and electronic properties of nitrogen-terminated H-Di(111) surfaces.</p></div>\",\"PeriodicalId\":22100,\"journal\":{\"name\":\"Surface Science\",\"volume\":\"749 \",\"pages\":\"Article 122555\"},\"PeriodicalIF\":2.1000,\"publicationDate\":\"2024-07-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface Science\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0039602824001067\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"CHEMISTRY, PHYSICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Science","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0039602824001067","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
Nitrogen, oxygen, and hydrogen bonding and thermal stability of ambient exposed nitrogen-terminated H-diamond (111) surfaces studied by XPS and HREELS
We report on the chemical composition, bonding, and in-vacuum thermal stability (up to 1000 °C) of nitrogen plasma terminated H-Diamond(111) (H-Di(111)) surfaces followed by ambient exposure. The nitrogen-plasma exposures include radio frequency (RF) (at pressure: 3 × 10−2 (damaging) and 7 × 10−2 Torr (non-damaging)) and microwave (MW) nitrogen plasmas and studied by X-ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HREELS). The largest nitrogen intake was observed upon exposure to RF(N2) damaging plasma, followed by MW(N2) and non-damaging RF(N2) plasmas. A similar trend follows the adsorption of adventitious oxygen. The XPS analysis shows that most of the adventitious oxygen is adsorbed in a COx configuration upon nitride surfaces exposure to ambient conditions. However, upon high temperature annealing of the damaging RF(N2) plasma exposed surface, some NOx (species) were detected by XPS. From the HREELS analysis, the hydrogen adsorbed on the H-Di(111) is not fully removed by exposure to the different nitrogen plasmas. These measurements show that NH(ads) species are formed on the surface and are desorbed upon vacuum annealing in the 500–700 °C range. This study may be of importance in all ex-situ applications influenced by the near-surface physicochemical and electronic properties of nitrogen-terminated H-Di(111) surfaces.
期刊介绍:
Surface Science is devoted to elucidating the fundamental aspects of chemistry and physics occurring at a wide range of surfaces and interfaces and to disseminating this knowledge fast. The journal welcomes a broad spectrum of topics, including but not limited to:
• model systems (e.g. in Ultra High Vacuum) under well-controlled reactive conditions
• nanoscale science and engineering, including manipulation of matter at the atomic/molecular scale and assembly phenomena
• reactivity of surfaces as related to various applied areas including heterogeneous catalysis, chemistry at electrified interfaces, and semiconductors functionalization
• phenomena at interfaces relevant to energy storage and conversion, and fuels production and utilization
• surface reactivity for environmental protection and pollution remediation
• interactions at surfaces of soft matter, including polymers and biomaterials.
Both experimental and theoretical work, including modeling, is within the scope of the journal. Work published in Surface Science reaches a wide readership, from chemistry and physics to biology and materials science and engineering, providing an excellent forum for cross-fertilization of ideas and broad dissemination of scientific discoveries.