等离子体中累积-扩散自聚焦结构中的安比极过程模型--第 3 部分:根据维西卡洛扰动理论对等离子体中带有电流的第一近似安比极扩散进行分类

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS IEEE Transactions on Plasma Science Pub Date : 2024-07-30 DOI:10.1109/TPS.2024.3350370
Philipp I. Vysikaylo
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引用次数: 0

摘要

在 Vysikaylo 的扰动理论基础上,提出了带电粒子的 Gromeka-Lamba 方程的解法。研究了由离子和电子惯性引起的新型伏极扩散,并对等离子体中的伏极扩散过程进行了分类。比较了三种主要的伏极扩散类型,它们是1) 肖特基扩散(由电子迁移率和温度高于离子迁移率和温度引起);2) 维西凯罗-泊松扩散(由等离子体的电中性受到干扰引起);3) 维西凯罗-欧勒扩散(由离子和电子的惯性引起)。计算了所有扩散系数,并确定了与主要等离子体参数的关系。根据伏极性扩散的分类,主要等离子体参数的跃迁(冲击波)被分为等离子体电中性破坏的冲击波(维西凯洛-泊松)和扩散冲击波,而扩散冲击波又被分为维西凯洛-欧勒冲击波和经典肖特基冲击波。考虑到等离子体总电流中的电子扩散,研究了带电粒子源和汇的变化。
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Model of Ambipolar Processes in Cumulative-Dissipative Self-Focusing Structures in Plasma—Part 3: Classification of Ambipolar Diffusions in Plasma With Current in the First Approximation According to the Vysikaylo’s Perturbation Theory
On the basis of Vysikaylo’s perturbation theory, it is solving of Gromeka-Lamba’s equations for charged particles suggested. The new type of ambipolar diffusion caused by inertia of ions and electrons had been investigated, and the processes of ambipolar diffusion in plasma had been classified. Three main types of ambipolar diffusion had been compared; they are: 1) Schottky’s diffusion (caused by higher electrons mobility and temperature than ions mobility and temperature); 2) Vysikaylo-Poisson’s diffusion (caused by the disturbance of electrical neutrality of plasma); and 3) Vysikaylo-Euler’s diffusion (caused by the inertia of ions and electrons). The coefficients of all diffusions had been calculated, and dependences on main plasma parameters had been determined. In accordance with the classification of ambipolar diffusions, jumps (shock waves) of the main plasma parameters were divided into shock waves with violation of the electrical neutrality of the plasma (Vysikaylo-Poisson) and diffusion shocks, which, in turn, were divided into Vysikaylo-Euler’s shocks and classical Schottky’s shocks. The modification of sources and sinks of charged particles was investigated by taking into account the electrons diffusion in the total current in the plasma.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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