用于双尺度结构优化的切割单元微结构

IF 2.7 4区 计算机科学 Q2 COMPUTER SCIENCE, SOFTWARE ENGINEERING Computer Graphics Forum Pub Date : 2024-07-31 DOI:10.1111/cgf.15139
Davi Colli Tozoni, Zizhou Huang, Daniele Panozzo, Denis Zorin
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引用次数: 0

摘要

双尺度拓扑优化与具有广泛有效材料参数的微结构族设计相结合,被广泛应用于许多制造领域,以实现各种物体的目标变形行为。这种方法的主要思路是优化被分割成相对较粗单元的物体中的材料特性分布,然后用模拟这些材料特性的微结构几何形状取代每个单元。在本文中,我们的重点是在必须保留形状表面的情况下,将这种方法应用于复杂形状。我们的方法将任何规则的(即定义在规则晶格网格上的)微结构族扩展到复杂形状,方法是用适应切割单元几何形状的瓷砖来丰富它。我们基于这种方法提出了一个全自动、稳健的管道,并证明了常规微结构族的性能受我们扩展的影响很小,同时允许将其用于高复杂度的二维和三维形状。
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Cut-Cell Microstructures for Two-scale Structural Optimization

Two-scale topology optimization, combined with the design of microstructure families with a broad range of effective material parameters, is widely used in many fabrication applications to achieve a target deformation behavior for a variety of objects. The main idea of this approach is to optimize the distribution of material properties in the object partitioned into relatively coarse cells, and then replace each cell with microstructure geometry that mimics these material properties. In this paper, we focus on adapting this approach to complex shapes in situations when preserving the shape's surface is essential.

Our approach extends any regular (i.e. defined on a regular lattice grid) microstructure family to complex shapes, by enriching it with tiles adapted to the geometry of the cut-cell. We propose a fully automated and robust pipeline based on this approach, and we show that the performance of the regular microstructure family is only minimally affected by our extension while allowing its use on 2D and 3D shapes of high complexity.

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来源期刊
Computer Graphics Forum
Computer Graphics Forum 工程技术-计算机:软件工程
CiteScore
5.80
自引率
12.00%
发文量
175
审稿时长
3-6 weeks
期刊介绍: Computer Graphics Forum is the official journal of Eurographics, published in cooperation with Wiley-Blackwell, and is a unique, international source of information for computer graphics professionals interested in graphics developments worldwide. It is now one of the leading journals for researchers, developers and users of computer graphics in both commercial and academic environments. The journal reports on the latest developments in the field throughout the world and covers all aspects of the theory, practice and application of computer graphics.
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