p-GaN/AlGaN/GaN HEMT 中阈值电压不稳定性的异常温度和偏置依赖性

IF 4.6 Q2 MATERIALS SCIENCE, BIOMATERIALS ACS Applied Bio Materials Pub Date : 2024-08-01 DOI:10.1109/JEDS.2024.3436820
Myeongsu Chae;Ho-Young Cha;Hyungtak Kim
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引用次数: 0

摘要

在这项工作中,我们研究了 p-GaN/AlGaN/GaN 高电子迁移率晶体管(HEMT)在正栅极偏压和高温条件下阈值电压(Vth)的不稳定性。我们揭示了阈值电压不稳定性的异常温度依赖性,表明阈值电压不稳定性在高温下存在显著差异,主要归因于带电载流子的捕获/俘获。值得注意的是,阈值电压的正移随着温度的升高而减小,并最终在低栅极偏置时逆转。相反,负偏移随着温度的升高而加剧,但由于电子和空穴的去捕获过程增强,在栅极偏压高于 100°C 时,负偏移开始减轻。这些结果表明,在不同的热条件下,阈值电压不稳定背后存在多种机制。
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Abnormal Temperature and Bias Dependence of Threshold Voltage Instability in p-GaN/AlGaN/GaN HEMTs
In this work, we investigated the instability of threshold voltage (Vth) in p-GaN/AlGaN/GaN high electron mobility transistors (HEMTs) under positive gate biases and high temperatures. We reveal an abnormal temperature dependence of threshold voltage instability, suggesting that threshold voltage instability significant differences at elevated temperatures and is primarily attributed to the trapping/detrapping of charged carriers. Notably, the positive shift in threshold voltage diminished and eventually reversed at low gate bias as the temperature increased. In contrast, the negative shift intensified with increasing temperature but began to mitigate above 100°C at high gate bias due to an enhanced de-trapping process of electrons and holes. These results suggest the presence of multiple mechanisms behind the threshold voltage instability under varying thermal conditions.
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来源期刊
ACS Applied Bio Materials
ACS Applied Bio Materials Chemistry-Chemistry (all)
CiteScore
9.40
自引率
2.10%
发文量
464
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