电容式弗里施栅 CdZnTeSe 检测器中的高分辨率 γ 射线光谱学

IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Electron Device Letters Pub Date : 2024-08-01 DOI:10.1109/LED.2024.3437230
Sandeep K. Chaudhuri;Ritwik Nag;Utpal N. Roy;Ralph B. James;Krishna C. Mandal
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引用次数: 0

摘要

四元半导体 Cd $_{{0}.{9}}$ Zn $_{{0}.{1}}$ Te $_{\text {1-{y}}}$ Sey (y =0.02-0.03)表现出极高的成分均匀性和低陷阱浓度,最近已成为室温探测伽马射线的坚固半导体晶体。在这封信中,我们报告了在不进行任何数字校正的情况下,3.4 毫米乘以 3.4 美元毫米乘以 9.7 美元毫米的虚拟弗里希网格探测器在暴露于 662-keV 伽马射线时实现了 1.4% 的高能量分辨率。上述能量分辨率是在大多数 CZTS 探测器获得如此高能量分辨率所需的偏置电压的一小部分下获得的。使用单极性海希特图和飞行时间法,电子的迁移率-寿命乘积为 4.42times 10^{-{3}}$ cm2/V,漂移迁移率为 882 cm2/V-s。优异的电子传输特性使我们能够首次通过实验计算出 CZTS 的电子-空穴对产生能量(4.47 eV)。我们还进行了双参数相关性研究,发现通过数字修正进一步提高检测性能具有非凡的潜力,并可应用于其他宽带隙或超宽带隙半导体。
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High-Resolution γ -Ray Spectroscopy in Capacitive Frisch Grid CdZnTeSe Detectors
The quaternary semiconductor Cd $_{{0}.{9}}$ Zn $_{{0}.{1}}$ Te $_{\text {1-{y}}}$ Se y (y =0.02–0.03), exhibiting exceptionally high compositional homogeneity and low trap concentrations, has recently emerged as a robust semiconductor crystal for room-temperature detection of gamma-rays. In this letter, we report a high energy resolution of 1.4% achieved for a 3.4 mm $\times 3.4$ mm $\times 9.7$ mm virtual Frisch grid detector when exposed to 662-keV gamma rays, without any digital correction. The above energy resolution was obtained at a fraction of the bias voltage needed to obtain such high energy resolution in most CZTS detectors. A mobility-lifetime product of $4.42\times 10^{-{3}}$ cm 2 /V and a drift mobility of 882 cm 2 /V-s for electrons were obtained using a single polarity Hecht plot and the time-of-flight method, respectively. The superior electron transport properties enabled us to calculate the electron-hole pair creation energy (4.47 eV) experimentally for the first time in CZTS. Biparametric correlation studies were performed, which revealed the extraordinary potential of further improvement in the detection performance through digital corrections and can be applied to other wide or ultra-wide bandgap semiconductors.
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来源期刊
IEEE Electron Device Letters
IEEE Electron Device Letters 工程技术-工程:电子与电气
CiteScore
8.20
自引率
10.20%
发文量
551
审稿时长
1.4 months
期刊介绍: IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.
期刊最新文献
Table of Contents Front Cover IEEE Electron Device Letters Publication Information IEEE Electron Device Letters Information for Authors Special Issue on Intelligent Sensor Systems for the IEEE Journal of Electron Devices
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