供应气体对等离子体诱导液体流动的影响

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS IEEE Transactions on Plasma Science Pub Date : 2024-08-02 DOI:10.1109/TPS.2024.3432879
Kecheng Shen;Heping Shi;Kazunori Koga;Masaharu Shiratani;Toshiyuki Kawasaki
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引用次数: 0

摘要

在这项工作中,我们使用粒子图像测速仪(PIV)研究了供气(氦气和氩气)对等离子体诱导液体流的影响。结果表明,供应氦气时,只产生向液体深度方向延伸的向下流动。然而,当提供氩气时,液流会随着电压的增加而切换。我们还发现电流波形和光学发射光谱结果也随着等离子体引发的液流类型发生了很大变化。根据氩气的实验结果,我们还成功地仅通过改变电压来切换和控制等离子体诱导的液流。
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Effects of Supplied Gas on Plasma-Induced Liquid Flows
In this work, we investigated the effects of supply gas (helium and argon gases) on plasma-induced liquid flows using particle image velocimetry (PIV). The results indicated that only the downward flow that extended to the liquid depth direction was generated when helium gas was supplied. However, the liquid flows switched with the increase in voltage when argon gas was supplied. We also discovered current waveforms and the optical emission spectroscopy results were greatly changed with the types of plasma-induced liquid flows. According to the experimental results for the argon gas, we also successfully switched and controlled the plasma-induced liquid flow by changing the voltage only.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
期刊最新文献
Table of Contents IEEE Transactions on Plasma Science Information for Authors IEEE Transactions on Plasma Science Publication Information Blank Page Extending the Operating Pressure Range of a Forevacuum-Pressure Plasma-Cathode Ribbon Electron Beam Source
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