电流发射的启动机制

IF 1.5 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS IEEE Transactions on Plasma Science Pub Date : 2024-08-02 DOI:10.1109/TPS.2024.3430534
Emanuele Spada;Silvia Deambrosis;Antonio De Lorenzi;Luca Lotto;Nicola Pilan;Silvia Spagnolo;Matteo Zuin
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引用次数: 0

摘要

人们早就知道电流发射的开关效应。这种效应包括一个开关电压的存在,高于这个电压,阴极的电流发射会突然转变到更高的值(1 - 2个数量级)。在接通事件后,即使在较低电压下,大电流发射状态也保持不变。我们的实验表明,这种开关事件不仅在电压(即阴极电场)超过一定值时发生,而且在长时间(数十-数百小时)施加相对较低的电场(约40$ MV/m)时也会发生。这些转变被解释为存在的金属绝缘体(MI)势垒结构的变化,例如在不锈钢电极中。本文首次从过渡时间、电流和电压水平的角度描述了由不同材料和/或不同表面处理的电极的这种效应。考虑因素最后暴露,以解释这种开关效应作为电荷积累的结果在MI阴极界面。
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The Switch-On Mechanism of the Current Emission
The switch-on effect of the current emission has been known for long time. This effect consists of the existence of a switch-on voltage, above which current emission from the cathode makes a sudden transition to higher value (one-two orders of magnitude). After the switch-on event, the high current emission status remains even at lower voltages. Our experiments have shown that this switch-on event occurs not only when the voltage (i.e., the cathode electric field) exceeds a certain value, but also occurs applying a relatively low electric field ( $\approx 40$ MV/m) for a long time (tens-hundreds of hours). These transitions are interpreted as changes in the structure of the metal-insulator (MI) potential barrier present, for example, in stainless steel electrodes. This article presents a first characterization of this effect in terms of transition time, current, and voltage level for electrodes made of different materials and/or with different surface treatments. Considerations are finally exposed to explain this switch-on effect as a consequence of the accumulation of electric charge at the MI cathode interface.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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